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Interfacial resistance due to thin films of alcohols and its effect on the rate of evaporation of water

dc.contributor.authorUdani, Lalitkumar Harilalen_US
dc.contributor.authorGordon, Kenneth F.en_US
dc.date.accessioned2006-04-28T15:40:36Z
dc.date.available2006-04-28T15:40:36Z
dc.date.issued1959-12en_US
dc.identifier.citationUdani, Lalit H.; Gordon, Kenneth F. (1959)."Interfacial resistance due to thin films of alcohols and its effect on the rate of evaporation of water." AIChE Journal 5(4): 510-513. <http://hdl.handle.net/2027.42/37306>en_US
dc.identifier.issn0001-1541en_US
dc.identifier.issn1547-5905en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/37306
dc.description.abstractMeasurements were obtained of the interfacial resistance due to thin films of straight-chain higher alcohols and their effect on the evaporation of water. This was done by passing preheated dry air at a constant rate over water in a beaker. Unlike previous studies both phases were stitted. Four alcohols, dodecyl, myristyl, cetyl, and stearyl, were studied. A large reduction in evaporation was observed when 0.00025 gm. of cetyl alcohol was added to 1 liter of water with gas-liquid interfacial area of 0.2015 sq. ft. A much higher amount of stearyl alcohol, 0.0006 g., was needed for commensurate effect. Resistance due to films of dodecyl and myristyl alcohols was neglibible. For the most part cetyl alcohol is the most effective of those tested. Plots are given of the pseudo mass transfer coefficients and interfacial resistances as a function of the amount of the various alcohols.en_US
dc.format.extent546414 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherAmerican Institute of Chemical Engineersen_US
dc.publisherWiley Periodiocals, Inc.en_US
dc.subject.otherChemistryen_US
dc.subject.otherChemical Engineeringen_US
dc.titleInterfacial resistance due to thin films of alcohols and its effect on the rate of evaporation of wateren_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumUniversity of Michigan, Ann Arbor, Michiganen_US
dc.contributor.affiliationumUniversity of Michigan, Ann Arbor, Michiganen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/37306/1/690050420_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/aic.690050420en_US
dc.identifier.sourceAIChE Journalen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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