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Chlorination of sulfur dioxide in a plasma arc photochemical reactor: Part I. Reactor performance

dc.contributor.authorQuarderer, George Josephen_US
dc.contributor.authorKadlec, Robert H.en_US
dc.date.accessioned2006-04-28T15:44:07Z
dc.date.available2006-04-28T15:44:07Z
dc.date.issued1974-01en_US
dc.identifier.citationQuarderer, George J.; Kadlec, Robert H. (1974)."Chlorination of sulfur dioxide in a plasma arc photochemical reactor: Part I. Reactor performance." AIChE Journal 20(1): 141-147. <http://hdl.handle.net/2027.42/37369>en_US
dc.identifier.issn0001-1541en_US
dc.identifier.issn1547-5905en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/37369
dc.description.abstractThis is a study of a photochemical reactor consisting of a vortex-stabilized arc and an annular, triple-walled, fused silica reaction chamber. An argon arc plasma provides the light. For power inputs of 3-12 kw, the spectral output of the light source was characterized as a function of wavelength, arc-gas flow rate, power input to the arc, and position along the arc. For power inputs of 3.84 and 8.45 kw, there were, respectively, 0.314 and 0.862 einsteins emitted per hour in the 2500 to 5000Å wavelength region. Selective filter solutions of 1.5N KNO 3 and 0.05N KI were investigated. A reactor analysis is presented, based on mass and energy balances, and the geometrical properties of the system.en_US
dc.format.extent763432 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherAmerican Institute of Chemical Engineersen_US
dc.publisherWiley Periodiocals, Inc.en_US
dc.subject.otherChemistryen_US
dc.subject.otherChemical Engineeringen_US
dc.titleChlorination of sulfur dioxide in a plasma arc photochemical reactor: Part I. Reactor performanceen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, Michiganen_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, Michigan ; Department of Chemical Engineering, University of Michigan, Ann Arbor, Michiganen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/37369/1/690200118_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/aic.690200118en_US
dc.identifier.sourceAIChE Journalen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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