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The role of conduction/valence bands and redox potential in accelerated mineral dissolution
dc.contributor.authorLeBlanc, S. E.en_US
dc.contributor.authorFogler, H. Scotten_US
dc.date.accessioned2006-04-28T15:45:29Z
dc.date.available2006-04-28T15:45:29Z
dc.date.issued1986-10en_US
dc.identifier.citationLeblanc, S. E.; Fogler, H. S. (1986)."The role of conduction/valence bands and redox potential in accelerated mineral dissolution." AIChE Journal 32(10): 1702-1709. <http://hdl.handle.net/2027.42/37394>en_US
dc.identifier.issn0001-1541en_US
dc.identifier.issn1547-5905en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/37394
dc.description.abstractThe dissolution kinetics of a number of manganese oxides in acidic solutions were studied. Using a slurry reactor, rate laws were determined for each of the manganese oxides in the hydrohalogen acids. Significant variations in the reaction rates (up to five orders of magnitude over the HCl base rate) were obtained with different acids. The addition of anions as neutral salts to acidic solutions is shown to produce the same rate-accelerating effect as acids containing that anion. The effect of the different acids on the oxide dissolution rates is explained using semiconductor band theory and energy diagrams.en_US
dc.format.extent631375 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherAmerican Institute of Chemical Engineersen_US
dc.publisherWiley Periodiocals, Inc.en_US
dc.subject.otherChemistryen_US
dc.subject.otherChemical Engineeringen_US
dc.titleThe role of conduction/valence bands and redox potential in accelerated mineral dissolutionen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, MI 48 109en_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, MI 48 109 ; Department of Chemical Engineering, University of Michigan, Ann Arbor, MI 48 109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/37394/1/690321013_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/aic.690321013en_US
dc.identifier.sourceAIChE Journalen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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