High-temperature kinetic study for the reactive ion etching of InP in BCl 3 /Ar/O 2

Abstract

The reactive ion etching kinetics of InP studied uses BCl 3 /Ar and BCl 3 /Ar/O 2 as etchants. High-temperature etching using BCl 3 and Ar increases the etch rate negligibly. However, the addition of 30% oxygen in the gas feed increases etch rates by a factor of 10,000 up to 1.5 micron/min at wafer temperatures of 250°C. X-ray photoelectron spectroscopy analysis reveals that oxygen removes the boron species adsorbing on the InP surface by scavenging the boron to form volatile boron oxides. To study the gas-phase chemistry, optical emission spectroscopy is used to monitor atomic chlorine intensity at different gas mixtures. The chlorine intensity shows a Gaussian-type dependence with oxygen addition, which is similar to the etch rate dependence. Two regimes of etching found are: at temperatures below 150°C, the etching is limited by the removal of indium chlorides; above 180°C, the etching is reaction-limited. The surface morphology shows that the etch profile becomes rougher as a result of increased chemical etching. At high power densities (0.21 W/cm 2 ) and intermediate temperatures (150°C), near vertical wall shapes are obtained. A kinetic model for the high-temperature etching is developed, as well as a rate law based on the InCl formation reaction. The rate law compares favorably with experimental etch rate results.