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A comparison of orthogonalized plane wave and augmented plane wave methods for calculating photodetachment cross-sections

dc.contributor.authorMohraz, Manijehen_US
dc.contributor.authorLohr, Lawrence L. Jr.en_US
dc.date.accessioned2006-04-28T16:33:48Z
dc.date.available2006-04-28T16:33:48Z
dc.date.issued1976-09en_US
dc.identifier.citationMohraz, Manijeh; Lohr, Lawrence L. (1976)."A comparison of orthogonalized plane wave and augmented plane wave methods for calculating photodetachment cross-sections." International Journal of Quantum Chemistry 10(5): 811-835. <http://hdl.handle.net/2027.42/37973>en_US
dc.identifier.issn0020-7608en_US
dc.identifier.issn1097-461Xen_US
dc.identifier.urihttps://hdl.handle.net/2027.42/37973
dc.description.abstractThe orthogonalized plane wave (OPW) method of calculating electronic continuum wave-functions is tested by the computation of photodetachment cross-sections and angular distributions for gaseous halide anions. The results are compared to those obtained by a related augmented plane wave (APW) method involving the exact solution of a single-particle SchrÖdinger equation containing a piecewise Coulombic potential energy. These comparisons, as well as other involving experimental and theoretical cross-sections from the literature, indicate that OPW cross-sections are, at best, only semi-quantitatively reliable for describing photodetachment even at low photon energies, and that OPW cross-sections should be calculated using the dipole length operator rather than the dipole velocity operator.en_US
dc.format.extent1281674 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherJohn Wiley & Sons, Inc.en_US
dc.subject.otherComputational Chemistry and Molecular Modelingen_US
dc.subject.otherAtomic, Molecular and Optical Physicsen_US
dc.titleA comparison of orthogonalized plane wave and augmented plane wave methods for calculating photodetachment cross-sectionsen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/37973/1/560100512_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/qua.560100512en_US
dc.identifier.sourceInternational Journal of Quantum Chemistryen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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