A final report to IBM on removing contaminants from wafers using focused acoustic waves
dc.contributor.author | Brereton, Giles John | en_US |
dc.contributor.author | Bruno, Bradford A. | en_US |
dc.contributor.author | Olson, Lorraine Gail | en_US |
dc.date.accessioned | 2006-02-03T17:20:12Z | |
dc.date.available | 2006-02-03T17:20:12Z | |
dc.date.issued | 1991 | en_US |
dc.identifier | UMR0449 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/3807 | |
dc.format.extent | 25 bytes | |
dc.format.extent | 39841 bytes | |
dc.format.extent | 3366 bytes | |
dc.format.extent | 44831 bytes | |
dc.format.extent | 2030053 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_US | en_US |
dc.subject | Semiconductor wafers -- Cleaning. | en_US |
dc.subject | Ultrasonic waves. | en_US |
dc.title | A final report to IBM on removing contaminants from wafers using focused acoustic waves | en_US |
dc.type | Technical Report | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/3807/5/bab2277.0001.001.pdf | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/3807/4/bab2277.0001.001.txt | en_US |
dc.owningcollname | Engineering, College of - Technical Reports |
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