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Chemical vapor deposition of tungsten oxide
dc.contributor.authorKirss, Rein U.en_US
dc.contributor.authorMeda, Lamartineen_US
dc.date.accessioned2006-04-28T16:52:13Z
dc.date.available2006-04-28T16:52:13Z
dc.date.issued1998-03en_US
dc.identifier.citationKirss, Rein U.; Meda, Lamartine (1998)."Chemical vapor deposition of tungsten oxide." Applied Organometallic Chemistry 12(3): 155-160. <http://hdl.handle.net/2027.42/38321>en_US
dc.identifier.issn0268-2605en_US
dc.identifier.issn1099-0739en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/38321
dc.description.abstractCrystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W(OEt) x , x  14= 145, 6] and tetra(allyl)tungsten [W(η 3 -C 3 H 5 ) 4 ] are summarized. The electrochromic behavior of these films is comparable with that observed for WO 3 films prepared by evaporation, sputtering and electrodeposition. © 1998 John Wiley & Sons, Ltd.en_US
dc.format.extent121246 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherJohn Wiley & Sons, Ltd.en_US
dc.subject.otherChemistryen_US
dc.subject.otherIndustrial Chemistry and Chemical Engineeringen_US
dc.titleChemical vapor deposition of tungsten oxideen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelBiological Chemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelHealth Sciencesen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationotherDepartment of Chemistry, Northeastern University, Boston, MA 02115, USA ; Department of Chemistry, Northeastern University, Boston, MA 02115, USAen_US
dc.contributor.affiliationotherDepartment of Chemistry, Northeastern University, Boston, MA 02115, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/38321/1/688_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Zen_US
dc.identifier.sourceApplied Organometallic Chemistryen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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