Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor
dc.contributor.author | Maury, Francis | en_US |
dc.contributor.author | Ossola, Franco | en_US |
dc.date.accessioned | 2006-04-28T16:52:24Z | |
dc.date.available | 2006-04-28T16:52:24Z | |
dc.date.issued | 1998-03 | en_US |
dc.identifier.citation | Maury, Francis; Ossola, Franco (1998)."Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor." Applied Organometallic Chemistry 12(3): 189-199. <http://hdl.handle.net/2027.42/38324> | en_US |
dc.identifier.issn | 0268-2605 | en_US |
dc.identifier.issn | 1099-0739 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/38324 | |
dc.description.abstract | Amorphous chromium carbonitride coatings with a low nitrogen content (3–8 at%) were deposited by low-pressure MOCVD in the temperature range 573–793 K using Cr(NEt 2 ) 4 as single-source precursor. This poor nitrogen incorporation is in agreement with the trends predicted by thermochemical calculations. XPS data, resistivity measurements and annealing experiments suggest that the films grown at 573 K are contaminated by organic species due to incomplete elimination of the ligands. The films deposited at higher temperature crystallize upon annealing at 873 K to form an orthorhombic ternary chromium carbonitride phase. The major volatile by-products of the MOCVD reaction were analyzed by 1 H and 13 C NMR. Their amount and the quasi-equimolar EtN=CHMe/HNEt 2 ratio suggest that most of the NEt 2 ligands are removed by a stepwise mechanism which probably occurs with other diethylamido complexes of transition metals when they are used as single-source precursors in MOCVD. The incorporation of the metalloid elements in the film is discussed in comparison with recent literature data. © 1998 John Wiley & Sons, Ltd. | en_US |
dc.format.extent | 227621 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | John Wiley & Sons, Ltd. | en_US |
dc.subject.other | Chemistry | en_US |
dc.subject.other | Industrial Chemistry and Chemical Engineering | en_US |
dc.title | Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Biological Chemistry | en_US |
dc.subject.hlbsecondlevel | Chemical Engineering | en_US |
dc.subject.hlbsecondlevel | Chemistry | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Health Sciences | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationother | Laboratoire de RÉactivitÉ et Protection des MatÉriaux, CNRS-INPT, Ecole Nationale SupÉrieure de Chimie, 118 route de Narbonne, 31077 Toulouse cedex 4, France ; Laboratoire de RÉactivitÉ et Protection des MatÉriaux, CNRS-INPT, Ecole Nationale SupÉrieure de Chimie, 118 route de Narbonne, 31077 Toulouse cedex 4, France | en_US |
dc.contributor.affiliationother | Istituto di Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, Area della Ricerca del CNR, Corso Stati Uniti 4, I-35127, Padova, Italy | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/38324/1/691_ftp.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1002/(SICI)1099-0739(199803)12:3<189::AID-AOC691>3.0.CO;2-3 | en_US |
dc.identifier.source | Applied Organometallic Chemistry | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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