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Ultrafast-ultrafine probing of high-speed electrical waveforms using a scanning force microscope with photoconductive gating

dc.contributor.authorWakana, Shin-ichien_US
dc.contributor.authorHama, S.en_US
dc.contributor.authorNees, John A.en_US
dc.date.accessioned2006-09-08T21:19:50Z
dc.date.available2006-09-08T21:19:50Z
dc.date.issued1996-07en_US
dc.identifier.citationNees, J.; Wakana, S. I.; Hama, S.; (1996). "Ultrafast-ultrafine probing of high-speed electrical waveforms using a scanning force microscope with photoconductive gating." Optical and Quantum Electronics 28(7): 843-865. <http://hdl.handle.net/2027.42/43337>en_US
dc.identifier.issn1572-817Xen_US
dc.identifier.issn0306-8919en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/43337
dc.description.abstractPicosecond photoconductivity in low-temperature-grown GaAs (LT GaAs) has been used to provide temporal resolution both in rigid probes and in scanning force microscope probes. This article reviews the fabrication and use of such probes. 2.5 ps temporal resolution and few microvolts sensitivity are obtained at arbitrary points on circuits with a spatial definition of 100 nm. Rigid probes are tested in application to analogue and digital circuits. As an alternative to electron beam testing, scanning force probes are applied to in situ imaging and waveform measurement. Finally, the use of time-resolved waveform analysis with scanning-force microscopy probes with semiconductor laser sources is demonstrated.en_US
dc.format.extent2181581 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherKluwer Academic Publishers; Chapman & Hall ; Springer Science+Business Mediaen_US
dc.subject.otherApplied Optics, Optoelectronics, Optical Devicesen_US
dc.subject.otherPhysicsen_US
dc.subject.otherCharacterization and Evaluation Materialsen_US
dc.subject.otherComputer Communication Networksen_US
dc.subject.otherElectronic and Computer Engineeringen_US
dc.titleUltrafast-ultrafine probing of high-speed electrical waveforms using a scanning force microscope with photoconductive gatingen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelMechanical Engineeringen_US
dc.subject.hlbsecondlevelElectrictrical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, University of Michigan, 1006 IST Bldg., 2200 Bonisteel, 48 109-2099, Ann Arbor, MI, USAen_US
dc.contributor.affiliationotherFujitsu Laboratories Ltd, 1-10 Morinosato, Wakamiya Atsugi, 243-01, Kanagawa, Japanen_US
dc.contributor.affiliationotherFujitsu Laboratories Ltd, 1-10 Morinosato, Wakamiya Atsugi, 243-01, Kanagawa, Japanen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/43337/1/11082_2004_Article_BF00820152.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/BF00820152en_US
dc.identifier.sourceOptical and Quantum Electronicsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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