Optical emission spectroscopy of electron-cyclotron-resonance-heated helium mirror plasmas
dc.contributor.author | Junck, K. L. | en_US |
dc.contributor.author | Getty, W. D. | en_US |
dc.contributor.author | Brake, Mary L. | en_US |
dc.date.accessioned | 2006-09-11T16:06:06Z | |
dc.date.available | 2006-09-11T16:06:06Z | |
dc.date.issued | 1991-03 | en_US |
dc.identifier.citation | Junck, K. L.; Brake, M. L.; Getty, W. D.; (1991). "Optical emission spectroscopy of electron-cyclotron-resonance-heated helium mirror plasmas." Plasma Chemistry and Plasma Processing 11(1): 15-39. <http://hdl.handle.net/2027.42/45473> | en_US |
dc.identifier.issn | 1572-8986 | en_US |
dc.identifier.issn | 0272-4324 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/45473 | |
dc.description.abstract | In this experiment emission spectroscopy in the 3000–5000 Å range has been utilized to determine the electron temperature (15–60 eV) and ion density (2–5 x 10 11 cm −3 ) of helium plasmas produced by the Michigan mirror machine (1) (MIMI). The plasma is generated and heated by whistler-mode electron-cyclotron resonance (ECR) waves at 7.43 GHz with 400–900 W power in 80-ms-long pulses. Gas fueling is provided at the midplane region by a leak valve with a range in pressure of 3 x 10 to 2 x 10 4 Torr. Emission line intensities are interpreted using a model of the important collisional and radiative processes occurring in the plasma. The model examines secondary processes such as radiation trapping, excitation transfer between levels of the carne principle quantum number, and excitation front metastable states for plasmas in the parameter range of MIMI ( n c = 1−6 x 10 11 cm −3 ). Front the analysis of line intensity ratios for neutral helium, the electron temperature is measured and its dependence upon the gas pressure and microwave power is determined. These temperatures agree with those obtained by Langmuir probe measurements. Art analysis of the line intensity ratio between singly ionized helium and neutral helium yields a measurement of the ion density which is in good agreement with electron density measurements made by a microwave interferometer. | en_US |
dc.format.extent | 797052 bytes | |
dc.format.extent | 3115 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Kluwer Academic Publishers-Plenum Publishers; Plenum Publishing Corporation ; Springer Science+Business Media | en_US |
dc.subject.other | Physics | en_US |
dc.subject.other | Characterization and Evaluation Materials | en_US |
dc.subject.other | Nuclear Physics, Heavy Ions, Hadrons | en_US |
dc.subject.other | Emission Spectroscopy | en_US |
dc.subject.other | ECR Mirror Plasma | en_US |
dc.subject.other | Mechanics | en_US |
dc.subject.other | Helium | en_US |
dc.subject.other | Mechanical Engineering | en_US |
dc.subject.other | Inorganic Chemistry | en_US |
dc.title | Optical emission spectroscopy of electron-cyclotron-resonance-heated helium mirror plasmas | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbsecondlevel | Chemistry | en_US |
dc.subject.hlbsecondlevel | Chemical Engineering | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering, Plasma Experimental Bay, University of Michigan, Ann Arbor, Michigan, USA | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering, Plasma Experimental Bay, University of Michigan, Ann Arbor, Michigan, USA | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, Plasma Experimental Bay, University of Michigan, Ann Arbor, Michigan, USA | en_US |
dc.contributor.affiliationumcampus | Ann Arbor | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/45473/1/11090_2005_Article_BF01447032.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1007/BF01447032 | en_US |
dc.identifier.source | Plasma Chemistry and Plasma Processing | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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