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Electron density measurements of argon surface-wave discharges
dc.contributor.authorPeters, M.en_US
dc.contributor.authorAsmussen, J.en_US
dc.contributor.authorRogers, J. H.en_US
dc.contributor.authorBrake, Mary L.en_US
dc.contributor.authorKerber, R.en_US
dc.date.accessioned2006-09-11T16:06:23Z
dc.date.available2006-09-11T16:06:23Z
dc.date.issued1985-09en_US
dc.identifier.citationBrake, M.; Rogers, J.; Peters, M.; Asmussen, J.; Kerber, R.; (1985). "Electron density measurements of argon surface-wave discharges." Plasma Chemistry and Plasma Processing 5(3): 255-261. <http://hdl.handle.net/2027.42/45477>en_US
dc.identifier.issn1572-8986en_US
dc.identifier.issn0272-4324en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/45477
dc.description.abstractThe electron density of microwave-generated surface-wave discharges in argon have been measured using Stark broadening and calculated from the measured wavelengths of the standing surface wave. Results obtained from these two techniques compare well. The electron density varies from 10 13 to 10 14 /cm 3 for pressures ranging from 50 to 800 torr.en_US
dc.format.extent345366 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherKluwer Academic Publishers-Plenum Publishers; Plenum Publishing Corporation ; Springer Science+Business Mediaen_US
dc.subject.otherInorganic Chemistryen_US
dc.subject.otherMechanicsen_US
dc.subject.otherNuclear Physics, Heavy Ions, Hadronsen_US
dc.subject.otherMechanical Engineeringen_US
dc.subject.otherSurface-wave Dischargeen_US
dc.subject.otherStark Broadeningen_US
dc.subject.otherArgon Plasmaen_US
dc.subject.otherPhysicsen_US
dc.subject.otherMicrowave Plasmaen_US
dc.subject.otherCharacterization and Evaluation Materialsen_US
dc.titleElectron density measurements of argon surface-wave dischargesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCollege of Engineering, Michigan State University, 48824, East Lansing, Michigan; Department of Nuclear Engineering, University of Michigan, 48109, Ann Arbor, Michiganen_US
dc.contributor.affiliationotherCollege of Engineering, Michigan State University, 48824, East Lansing, Michigan; MIT Lincoln Laboratory, 02173, Lexington, Massachusettsen_US
dc.contributor.affiliationotherCollege of Engineering, Michigan State University, 48824, East Lansing, Michiganen_US
dc.contributor.affiliationotherCollege of Engineering, Michigan State University, 48824, East Lansing, Michiganen_US
dc.contributor.affiliationotherCollege of Engineering, Michigan State University, 48824, East Lansing, Michiganen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/45477/1/11090_2004_Article_BF00615124.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/BF00615124en_US
dc.identifier.sourcePlasma Chemistry and Plasma Processingen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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