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Production of XeO * in a CW microwave discharge

dc.contributor.authorPassow, Michael L.en_US
dc.contributor.authorBrake, Mary L.en_US
dc.date.accessioned2006-09-11T16:06:36Z
dc.date.available2006-09-11T16:06:36Z
dc.date.issued1989-12en_US
dc.identifier.citationPassow, M. L.; Brake, M. L.; (1989). "Production of XeO * in a CW microwave discharge." Plasma Chemistry and Plasma Processing 9(4): 497-511. <http://hdl.handle.net/2027.42/45480>en_US
dc.identifier.issn0272-4324en_US
dc.identifier.issn1572-8986en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/45480
dc.description.abstractA low-power CW microwave discharge at 2.45 GHz was used to produce XeO * excimer molecules. It was found that a total gas pressure between 5 and 20 Torr, absorbed power of about 20–100 W, and an oxygen-to-xenon ratio of 1∶100 maximized the XeO( 1 S− 1 D) green emission at 5200 to 5600 Å. The XeO * emission appeared in the cooler parts of the discharge near the containment tube walls and in the electric field nodes of the TM 012 resonant mode.en_US
dc.format.extent712256 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherKluwer Academic Publishers-Plenum Publishers; Plenum Publishing Corporation ; Springer Science+Business Mediaen_US
dc.subject.otherXeOen_US
dc.subject.otherPhysicsen_US
dc.subject.otherCharacterization and Evaluation Materialsen_US
dc.subject.otherNuclear Physics, Heavy Ions, Hadronsen_US
dc.subject.otherMechanical Engineeringen_US
dc.subject.otherMicrowave Dischargeen_US
dc.subject.otherEmission Spectroscopyen_US
dc.subject.otherMechanicsen_US
dc.subject.otherInorganic Chemistryen_US
dc.titleProduction of XeO * in a CW microwave dischargeen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering, University of Michigan, 48109, Ann Arbor, Michiganen_US
dc.contributor.affiliationumDepartment of Nuclear Engineering, University of Michigan, 48109, Ann Arbor, Michiganen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/45480/1/11090_2005_Article_BF01023916.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/BF01023916en_US
dc.identifier.sourcePlasma Chemistry and Plasma Processingen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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