View Item 

Show simple item record

First-principles study of the α-Al 2 O 3 (0001)/Cu(111) interface
dc.contributor.authorZhao, G. L.en_US
dc.contributor.authorSmith, J. R.en_US
dc.contributor.authorRaynolds, J. E.en_US
dc.contributor.authorSrolovitz, David J.en_US
dc.date.accessioned2006-09-11T17:15:39Z
dc.date.available2006-09-11T17:15:39Z
dc.date.issued1996-12en_US
dc.identifier.citationZhao, G. L.; Smith, J. R.; Raynolds, J.; Srolovitz, D. J.; (1996). "First-principles study of the α-Al 2 O 3(0001)/Cu(111) interface." Interface Science 3 (4): 289-302. <http://hdl.handle.net/2027.42/46002>en_US
dc.identifier.issn0927-7056en_US
dc.identifier.issn1573-2746en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/46002
dc.description.abstractAdhesive energetics and interfacial electronic structures have been computed from first principles for the Cu/Al 2 O 3 interface. Recent transmission electron microscopy results of Cu grown by molecular beam epitaxy on Al 2 O 3 (0001) were helpful in modelling the interfacial atomic structure. We found that Al 2 O 3 (0001) relaxation effects can lower the work of adhesion W ad by over a factor of 3. Our computed W ad value is in reasonably good agreement with experiment, being somewhat larger, as expected from our assumption of a coherent interface. One might begin to understand this metal/ceramic adhesion as a competition between Cu and Al for oxide formation, which is easily won by Al. However this simple picture is complicated by several indications of a significant metallic/covalent component to the Cu/Al 2 O 3 adhesive bond.en_US
dc.format.extent1205137 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherKluwer Academic Publishers; Springer Science+Business Mediaen_US
dc.subject.otherEngineeringen_US
dc.subject.otherMaterials Processing, Characterization, and Designen_US
dc.subject.otherAdhesionen_US
dc.subject.otherMetal/Ceramic Bondingen_US
dc.subject.otherQuantum Mechanical Computationsen_US
dc.titleFirst-principles study of the α-Al 2 O 3 (0001)/Cu(111) interfaceen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelBiological Chemistryen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelHealth Sciencesen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials and Engineering, University of Michigan, 48109-2136, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Materials and Engineering, University of Michigan, 48109-2136, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Materials and Engineering, University of Michigan, 48109-2136, Ann Arbor, MI, USAen_US
dc.contributor.affiliationotherPhysics and Physical Chemistry Department, GM R&D Center, 48090-9055, Warren, MI, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/46002/1/10793_2004_Article_BF00194707.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/BF00194707en_US
dc.identifier.sourceInterface Scienceen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Name:
10793_2004_Article_BF00194707.pdf
Size:
1.149MB
Format:
PDF
View/Open

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.