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Reduction of multi-photon ionization in dielectrics due to collisions
dc.contributor.authorDu, D.en_US
dc.contributor.authorLiu, X.en_US
dc.contributor.authorMourou, Gerard A.en_US
dc.date.accessioned2006-09-11T18:31:32Z
dc.date.available2006-09-11T18:31:32Z
dc.date.issued1996-12en_US
dc.identifier.citationDu, D.; Liu, X.; Mourou, G.; (1996). "Reduction of multi-photon ionization in dielectrics due to collisions." Applied Physics B Laser and Optics 63(6): 617-621. <http://hdl.handle.net/2027.42/47043>en_US
dc.identifier.issn0946-2171en_US
dc.identifier.issn1432-0649en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/47043
dc.description.abstractThe collisional effect due to the multi-photon ionization process in dielectric material has been studied. We found that the breakdown threshold of fused silica is the same for both linearly and circularly polarized light at 55 fs and 100 fs, which we believe is an indication of the suppression of multi-photon ionization in solids. By numerically solving the time-dependent Schrödinger equation with scattering, for the first time, we have observed substantial reduction of the multi-photon ionization rate in dielectrics due to collisions.en_US
dc.format.extent429651 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherSpringer-Verlagen_US
dc.subject.other77.32.Jpen_US
dc.subject.otherPhysical Chemistryen_US
dc.subject.otherPhysicsen_US
dc.subject.other32.80.Rmen_US
dc.subject.otherLaser Technology and Physics, Photonicsen_US
dc.subject.otherPhysics and Applied Physics in Engineeringen_US
dc.subject.otherElectromagnetism, Optics and Lasersen_US
dc.subject.otherQuantum Optics, Quantum Electronics, Nonlinear Opticsen_US
dc.subject.otherOptical Spectroscopy, Ultrafast Opticsen_US
dc.titleReduction of multi-photon ionization in dielectrics due to collisionsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelMathematicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, The University of Michigan, 2200 Bonisteel Blvd., Room 1006, 48109-2099, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, The University of Michigan, 2200 Bonisteel Blvd., Room 1006, 48109-2099, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, The University of Michigan, 2200 Bonisteel Blvd., Room 1006, 48109-2099, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/47043/1/340_2005_Article_BF01831002.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/BF01831002en_US
dc.identifier.sourceApplied Physics B Laser and Opticsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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