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Planar ion trap geometry for microfabrication

dc.contributor.authorStick, Daniel Lynnen_US
dc.contributor.authorHensinger, W. K.en_US
dc.contributor.authorRabchuk, J. A.en_US
dc.contributor.authorMonroe, C.en_US
dc.contributor.authorMadsen, M. J.en_US
dc.date.accessioned2006-09-11T18:31:49Z
dc.date.available2006-09-11T18:31:49Z
dc.date.issued2004-03en_US
dc.identifier.citationMadsen, M.J.; Hensinger, W.K.; Stick, D.; Rabchuk, J.A.; Monroe, C.; (2004). "Planar ion trap geometry for microfabrication." Applied Physics B 78(5): 639-651. <http://hdl.handle.net/2027.42/47047>en_US
dc.identifier.issn1432-0649en_US
dc.identifier.issn0946-2171en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/47047
dc.description.abstractWe describe a novel high aspect ratio radiofrequency linear ion trap geometry that is amenable to modern microfabrication techniques. The ion trap electrode structure consists of a pair of stacked conducting cantilevers resulting in confining fields that take the form of fringe fields from parallel plate capacitors. The confining potentials are modeled both analytically and numerically. This ion trap geometry may form the basis for large scale quantum computers or parallel quadrupole mass spectrometers.en_US
dc.format.extent2245017 bytes
dc.format.extent3115 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherSpringer-Verlagen_US
dc.subject.otherPhysicsen_US
dc.titlePlanar ion trap geometry for microfabricationen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelMathematicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Physics, FOCUS Center and University of Michigan, USAen_US
dc.contributor.affiliationumDepartment of Physics, FOCUS Center and University of Michigan, USAen_US
dc.contributor.affiliationumDepartment of Physics, FOCUS Center and University of Michigan, USAen_US
dc.contributor.affiliationumDepartment of Physics, FOCUS Center and University of Michigan, USAen_US
dc.contributor.affiliationotherWestern Illinois University, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/47047/1/340_2004_Article_1414.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1007/s00340-004-1414-9en_US
dc.identifier.sourceApplied Physics Ben_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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