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Kinetics and fractal properties of the random sequential adsorption of line segments

dc.contributor.authorZiff, Robert M.en_US
dc.contributor.authorVigil, R. Dennisen_US
dc.date.accessioned2006-12-19T18:51:12Z
dc.date.available2006-12-19T18:51:12Z
dc.date.issued1990-11-07en_US
dc.identifier.citationZiff, R M; Vigil, R D (1990). "Kinetics and fractal properties of the random sequential adsorption of line segments." Journal of Physics A: Mathematical and General. 23(21): 5103-5108. <http://hdl.handle.net/2027.42/48820>en_US
dc.identifier.issn0305-4470en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48820
dc.description.abstractThe random sequential adsorption (RSA) of infinitely-thin line segments is studied by computer simulation. It is shown that the exponent for the time dependence of the surface coverage increases beyond the value 0.33, reported by Sherwood (1990), to a value of 0.38, at later times. It is also argued that the fractal dimension of the adsorbed lines is about 1.8 making use of a previous result on the RSA of rectangular objects.en_US
dc.format.extent3118 bytes
dc.format.extent326775 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleKinetics and fractal properties of the random sequential adsorption of line segmentsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationotherDept. of Chem. Eng., Michigan Univ., Ann Arbor, MI, USAen_US
dc.contributor.affiliationotherDept. of Chem. Eng., Michigan Univ., Ann Arbor, MI, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48820/2/jav23i21p5103.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0305-4470/23/21/044en_US
dc.identifier.sourceJournal of Physics A: Mathematical and General.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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