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Ion current distribution on a substrate during nanostructure formation

dc.contributor.authorLevchenko, Igoren_US
dc.contributor.authorKorobov, M.en_US
dc.contributor.authorRomanov, M.en_US
dc.contributor.authorKeidar, Michaelen_US
dc.date.accessioned2006-12-19T18:59:32Z
dc.date.available2006-12-19T18:59:32Z
dc.date.issued2004-06-21en_US
dc.identifier.citationLevchenko, I; Korobov, M; Romanov, M; Keidar, M (2004). "Ion current distribution on a substrate during nanostructure formation." Journal of Physics D: Applied Physics. 37(12): 1690-1695. <http://hdl.handle.net/2027.42/48921>en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48921
dc.description.abstractThe distribution of an ion current density on a substrate with a discontinuous film consisting of islands of dimension 25–100 nm was studied numerically. It was found that the ion current distribution is highly non-uniform and islands of the discontinuous film are enclosed with sharply defined zones where the current density is very low. The total area of low current zones reaches 30–50% of the substrate area, depending on the voltage applied to the substrate. The ratio of island radius–low current zone width depends on the island size and equals approximately 1.0 for large islands and 0.5 for small islands. It is shown that the island distribution function may be controlled by bias voltage variation.en_US
dc.format.extent3118 bytes
dc.format.extent319765 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleIon current distribution on a substrate during nanostructure formationen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Aerospace Engineering, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherNational Aerospace University, Kharkov, Ukraineen_US
dc.contributor.affiliationotherNational Aerospace University, Kharkov, Ukraineen_US
dc.contributor.affiliationotherNational Aerospace University, Kharkov, Ukraineen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48921/2/d4_12_014.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0022-3727/37/12/014en_US
dc.identifier.sourceJournal of Physics D: Applied Physics.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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