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Sub-bandgap photoconductivity in ZnO epilayers and extraction of trap density spectra

dc.contributor.authorMoazzami, K.en_US
dc.contributor.authorMurphy, T. E.en_US
dc.contributor.authorPhillips, J. D.en_US
dc.contributor.authorCheung, M. C-K.en_US
dc.contributor.authorCartwright, A. N.en_US
dc.date.accessioned2006-12-19T19:00:38Z
dc.date.available2006-12-19T19:00:38Z
dc.date.issued2006-06-01en_US
dc.identifier.citationMoazzami, K; Murphy, T E; Phillips, J D; Cheung, M C-K; Cartwright, A N (2006). "Sub-bandgap photoconductivity in ZnO epilayers and extraction of trap density spectra." Semiconductor Science and Technology. 21(6): 717-723. <http://hdl.handle.net/2027.42/48934>en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48934
dc.description.abstractPhotoconductivity is observed in ZnO epilayers due to photoexcitation in the visible spectral region of 400–700 nm, below the ZnO bandgap energy of 3.4 eV. Photoconductive transients due to visible photoexcitation have time constants in the order of minutes. Treatment of the ZnO surface with SiO2 passivation layers results in a significant reduction in the photoconductive signal and photoconductive time constant. The photoconductive response is attributed to hole traps in ZnO, where a rate equation model is presented to describe the photoconductive characteristics. A method of extracting the hole trap density spectrum is presented on the basis of the rate equation model and assumptions for hole capture lifetime and carrier recombination lifetime that are validated by experimental time-resolved photoluminescence measurements of the material under study. Traps are found to be distributed near 0.75 eV and 0.9 eV from the valence band edge for SiO2 passivated and unpassivated ZnO epilayers, respectively.en_US
dc.format.extent3118 bytes
dc.format.extent235117 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleSub-bandgap photoconductivity in ZnO epilayers and extraction of trap density spectraen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationotherDepartment of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY 14260, USAen_US
dc.contributor.affiliationotherDepartment of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, NY 14260, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48934/2/sst6_6_001.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0268-1242/21/6/001en_US
dc.identifier.sourceSemiconductor Science and Technology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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