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Impact of doping and MOCVD conditions on minority carrier lifetime of zinc- and carbon-doped InGaAs and its applications to zinc- and carbon-doped InP/InGaAs heterostructure bipolar transistors

dc.contributor.authorCui, Delongen_US
dc.contributor.authorHubbard, Seth M.en_US
dc.contributor.authorPavlidis, Dimitrisen_US
dc.contributor.authorEisenbach, Andreasen_US
dc.contributor.authorChelli, Cyrilen_US
dc.date.accessioned2006-12-19T19:00:43Z
dc.date.available2006-12-19T19:00:43Z
dc.date.issued2002-06-01en_US
dc.identifier.citationCui, Delong; Hubbard, Seth M; Pavlidis, Dimitris; Eisenbach, Andreas; Chelli, Cyril (2002). "Impact of doping and MOCVD conditions on minority carrier lifetime of zinc- and carbon-doped InGaAs and its applications to zinc- and carbon-doped InP/InGaAs heterostructure bipolar transistors." Semiconductor Science and Technology. 17(6): 503-509. <http://hdl.handle.net/2027.42/48935>en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48935
dc.description.abstractThe impact of doping and metalorganic chemical vapour deposition growth conditions on the minority carrier lifetime of zinc- and carbon-doped InGaAs is reported. Room temperature photoluminescence measurements have been employed to obtain direct information on the non-radiative lifetime of the materials. Low growth temperature and low V/III ratio lead to the lower carrier lifetime of the carbon-doped InGaAs samples. InP/InGaAs heterostructure bipolar transistors were grown and fabricated using both zinc- and carbon-doped InGaAs layers as the base regions. The current gain values measured for these devices agree well with the values calculated from the carrier lifetime and mobility/diffusion coefficient measurements.en_US
dc.format.extent3118 bytes
dc.format.extent315784 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleImpact of doping and MOCVD conditions on minority carrier lifetime of zinc- and carbon-doped InGaAs and its applications to zinc- and carbon-doped InP/InGaAs heterostructure bipolar transistorsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer ScienceURL: http://www.eecs.umich.edu/dp~group/, The University of Michigan, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer ScienceURL: http://www.eecs.umich.edu/dp~group/, The University of Michigan, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer ScienceURL: http://www.eecs.umich.edu/dp~group/, The University of Michigan, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer ScienceURL: http://www.eecs.umich.edu/dp~group/, The University of Michigan, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer ScienceURL: http://www.eecs.umich.edu/dp~group/, The University of Michigan, Ann Arbor, MI, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48935/2/s20601.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0268-1242/17/6/301en_US
dc.identifier.sourceSemiconductor Science and Technology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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