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Successive ionic layer deposition (SILD) as a new sensor technology: synthesis and modification of metal oxidesThis article was presented at the 13th International Conference on Sensors and Their Applications, held in Chatham, Kent, on 6–7 September 2005.

dc.contributor.authorKorotcenkov, G.en_US
dc.contributor.authorTolstoy, V.en_US
dc.contributor.authorSchwank, Johannes W.en_US
dc.date.accessioned2006-12-19T19:11:38Z
dc.date.available2006-12-19T19:11:38Z
dc.date.issued2006-07-01en_US
dc.identifier.citationKorotcenkov, G; Tolstoy, V; Schwank, J (2006). "Successive ionic layer deposition (SILD) as a new sensor technology: synthesis and modification of metal oxidesThis article was presented at the 13th International Conference on Sensors and Their Applications, held in Chatham, Kent, on 6–7 September 2005.." Measurement Science and Technology. 17(7): 1861-1869. <http://hdl.handle.net/2027.42/49066>en_US
dc.identifier.issn0957-0233en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/49066
dc.description.abstractIn this paper, we have discussed both peculiarities and advantages of successive ionic layer deposition (SILD) methods for the synthesis and modification of metal oxides. For these purposes, the results of research into the design of SILD technology suitable for preparing porous nanostructure SnO2 films and the surface modification of SnO2 films deposited by spray pyrolysis have been analysed. It has been shown that this new method can be used for the deposition of metal oxides and for noble metals. A great deal of interest in the SILD method may be generated by the method's simplicity, cheapness, and ability to deposit thin nanostructure films on rough surfaces. The SILD method essentially consists of successive treatments of both conductive and dielectric substrates by solutions of various salts, which form poorly soluble compounds at the substrate surface. It has been found that SILD technology is an effective method for improving gas sensor parameters. For example, it has been established that surface modification by Pd and Ag using SILD technology improves the gas response of SnO2-based sensors to reducing gases, and depresses their sensitivity to oxidizing gases.en_US
dc.format.extent3118 bytes
dc.format.extent1145733 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleSuccessive ionic layer deposition (SILD) as a new sensor technology: synthesis and modification of metal oxidesThis article was presented at the 13th International Conference on Sensors and Their Applications, held in Chatham, Kent, on 6–7 September 2005.en_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, USAen_US
dc.contributor.affiliationotherLaboratory of Micro- and Optoelectronics, Technical University of Moldova, Bld Stefan cel Mare, 168, Chisinau, 2004, Republic of Moldovaen_US
dc.contributor.affiliationotherDepartment of Chemistry, St Petersburg State University, St Petersburg, Russiaen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/49066/2/mst6_7_026.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0957-0233/17/7/026en_US
dc.identifier.sourceMeasurement Science and Technology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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