Show simple item record

Misfit effects in adhesion calculations

dc.contributor.authorSchnitker, Jurgenen_US
dc.contributor.authorSrolovitz, David J.en_US
dc.date.accessioned2006-12-19T19:13:06Z
dc.date.available2006-12-19T19:13:06Z
dc.date.issued1998-03-01en_US
dc.identifier.citationSchnitker, Jurgen; Srolovitz, David J (1998). "Misfit effects in adhesion calculations ." Modelling and Simulation in Materials Science and Engineering. 6(2): 153-164. <http://hdl.handle.net/2027.42/49084>en_US
dc.identifier.issn0965-0393en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/49084
dc.description.abstractThe work of adhesion of bimaterial interfaces is commonly computed using quantum mechanical methods in which the two materials are strained into coherency. There is no relaxation of the coherency by the formation of an array of interfacial misfit dislocations, contrary to what is commonly observed for essentially all systems other than very thin films. In this paper, we investigate the errors introduced into the work of adhesion associated with the assumption of coherency. Series of atomistic simulations in two and three dimensions are performed using a simple Lennard-Jones-type model potential. We demonstrate that the assumption of coherency introduces errors that increase rapidly with misfit (for small misfit) and can easily be of the order of several tens of percent. We trace the source of these errors to the neglect of the elastic fields of misfit dislocations and to the variation in the number of bonds per unit interfacial area with misfit when coherency is assumed. Suggestions are made to minimize and/or correct for this error.en_US
dc.format.extent3118 bytes
dc.format.extent136446 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleMisfit effects in adhesion calculationsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109-2136, USAen_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109-2136, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/49084/2/ms8205.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0965-0393/6/2/005en_US
dc.identifier.sourceModelling and Simulation in Materials Science and Engineering.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.