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On the conditions of carbon nanotube growth in the arc discharge

dc.contributor.authorKeidar, Michaelen_US
dc.contributor.authorWaas, Anthony M.en_US
dc.date.accessioned2006-12-19T19:24:38Z
dc.date.available2006-12-19T19:24:38Z
dc.date.issued2004-11-01en_US
dc.identifier.citationKeidar, M; Waas, A M (2004). "On the conditions of carbon nanotube growth in the arc discharge." Nanotechnology. 15(11): 1571-1575. <http://hdl.handle.net/2027.42/49221>en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/49221
dc.description.abstractThe conditions for single wall carbon nanotube formation in the arc discharge method of nanotube production are described. Carbon nanotube seed formation and charging in the interelectrode gap are found to be very important effects that may alter carbon nanotube formation on the cathode surface. The model predicts that the long carbon nanotubes formed in the relatively dense plasma region can be deposited on the cathode surface. The nanotubes in the cathode deposit are primarily oriented in the cathode surface plane and not along the electric field. This prediction is qualitatively confirmed by an SEM analysis of the cathode deposit.en_US
dc.format.extent3118 bytes
dc.format.extent796155 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleOn the conditions of carbon nanotube growth in the arc dischargeen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumDepartment of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/49221/2/nano4_11_034.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0957-4484/15/11/034en_US
dc.identifier.sourceNanotechnology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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