On the conditions of carbon nanotube growth in the arc discharge
dc.contributor.author | Keidar, Michael | en_US |
dc.contributor.author | Waas, Anthony M. | en_US |
dc.date.accessioned | 2006-12-19T19:24:38Z | |
dc.date.available | 2006-12-19T19:24:38Z | |
dc.date.issued | 2004-11-01 | en_US |
dc.identifier.citation | Keidar, M; Waas, A M (2004). "On the conditions of carbon nanotube growth in the arc discharge." Nanotechnology. 15(11): 1571-1575. <http://hdl.handle.net/2027.42/49221> | en_US |
dc.identifier.issn | 0957-4484 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/49221 | |
dc.description.abstract | The conditions for single wall carbon nanotube formation in the arc discharge method of nanotube production are described. Carbon nanotube seed formation and charging in the interelectrode gap are found to be very important effects that may alter carbon nanotube formation on the cathode surface. The model predicts that the long carbon nanotubes formed in the relatively dense plasma region can be deposited on the cathode surface. The nanotubes in the cathode deposit are primarily oriented in the cathode surface plane and not along the electric field. This prediction is qualitatively confirmed by an SEM analysis of the cathode deposit. | en_US |
dc.format.extent | 3118 bytes | |
dc.format.extent | 796155 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_US | |
dc.publisher | IOP Publishing Ltd | en_US |
dc.title | On the conditions of carbon nanotube growth in the arc discharge | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationumcampus | Ann Arbor | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/49221/2/nano4_11_034.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1088/0957-4484/15/11/034 | en_US |
dc.identifier.source | Nanotechnology. | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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