A hybrid mask–mould lithography scheme and its application in nanoscale organic thin film transistors

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dc.contributor.author Cheng, Xing en_US
dc.contributor.author Guo, L. Jay en_US
dc.date.accessioned 2006-12-19T19:25:03Z
dc.date.available 2006-12-19T19:25:03Z
dc.date.issued 2006-02-28 en_US
dc.identifier.citation Cheng, Xing; Guo, L Jay (2006). "A hybrid mask–mould lithography scheme and its application in nanoscale organic thin film transistors." Nanotechnology. 17(4): 927-932. <http://hdl.handle.net/2027.42/49226> en_US
dc.identifier.issn 0957-4484 en_US
dc.identifier.uri http://hdl.handle.net/2027.42/49226
dc.description.abstract Nanoimprint lithography (NIL) has stimulated great interest in both academic research and industrial development due to its high resolution, high throughput and low cost advantages. Though NIL has been demonstrated to be very successful in replicating nanoscale features, it also has its limitations as a general lithography technique. Its fundamental moulding characteristics (i.e. physically displacing polymer materials) frequently lead to pattern defects when replicating arbitrary patterns, especially patterns with broad size distribution. To solve this problem, we have developed a combined nanoimprint and photolithography technique that uses a hybrid mould to achieve good pattern definitions. In this work, we applied this technique to fabricate finger-shaped nanoelectrodes, and demonstrated nanoscale pentacene organic thin film transistors (OTFTs). Methods of the hybrid mask–mould (HMM) fabrication and results on the device electrical characteristics are provided. With combined advantages of both photolithography and NIL, and the applicability to general nanoscale device and system fabrication, this method can become a valuable choice for low cost mass production of micro- and nanoscale structures, devices and systems. en_US
dc.format.extent 3118 bytes
dc.format.extent 832303 bytes
dc.format.mimetype text/plain
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.publisher IOP Publishing Ltd en_US
dc.title A hybrid mask–mould lithography scheme and its application in nanoscale organic thin film transistors en_US
dc.type Article en_US
dc.subject.hlbsecondlevel Physics en_US
dc.subject.hlbtoplevel Science en_US
dc.description.peerreviewed Peer Reviewed en_US
dc.identifier.pmid 21727361 en_US
dc.description.bitstreamurl http://deepblue.lib.umich.edu/bitstream/2027.42/49226/2/nano6_4_015.pdf en_US
dc.identifier.doi http://dx.doi.org/10.1088/0957-4484/17/4/015 en_US
dc.identifier.source Nanotechnology. en_US
dc.owningcollname Interdisciplinary and Peer-Reviewed
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