Nanoimprint Lithography: Methods and Material Requirements
(2007). "Nanoimprint Lithography: Methods and Material Requirements It is a great pleasure to acknowledge many wonderful students, postdoctoral fellows, and colleagues who have contributed to the work described in this article. This review is dedicated to all of them. Special thanks to Dr. Peng-Fei Fu at Dow Corning Corporation (USA) for the recent collaborations on the development of new materials for nanoimprint technology. This work was supported by NSF grants ECS-0424204 and ECS-0508252, AFOSR grant FA9550-04-1-0312, and NSFC grant No. 60528003. ." Advanced Materials 19(4): 495-513. <http://hdl.handle.net/2027.42/55959>
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