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Nanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arrays
dc.contributor.authorLucas, Brandon D.en_US
dc.contributor.authorKim, Jin-Sungen_US
dc.contributor.authorChin, Christineen_US
dc.contributor.authorGuo, L. Jayen_US
dc.date.accessioned2008-03-31T18:42:04Z
dc.date.available2009-04-09T15:01:14Zen_US
dc.date.issued2008-03-18en_US
dc.identifier.citationLucas, Brandon D.; Kim, Jin-Sung; Chin, Christine; Guo, L. Jay (2008). "Nanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arrays B. D. L. and J.-S. K. contributed equally to this work. This work is supported by CDC grant with a subcontract from Duke University (No. 04-SC-CDC-1012), an AFOSR grant FA9550-06-1-0510, an NSFC grant no. 60528003, and a NATO grant CBP.NUKR.CLG 981776. B. Lucas would like to thank the David and Lucile Packard Foundation and UNCF-Merck Science Initiative for their generous support. ." Advanced Materials 20(6): 1129-1134. <http://hdl.handle.net/2027.42/58080>en_US
dc.identifier.issn0935-9648en_US
dc.identifier.issn1521-4095en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/58080
dc.description.abstractNo Abstract.en_US
dc.format.extent287585 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherWILEY-VCH Verlagen_US
dc.subject.otherChemistryen_US
dc.subject.otherPolymer and Materials Scienceen_US
dc.titleNanoimprint Lithography Based Approach for the Fabrication of Large-Area, Uniformly-Oriented Plasmonic Arraysen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumUniversity of Michigan-Applied Physics, 2477 Randall Laboratory, 450 Church St., Ann Arbor, MI48109 (USA)en_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan Solid State Electronics Laboratory, 1301 Beal Ave., Ann Arbor, MI 48109en_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan Solid State Electronics Laboratory, 1301 Beal Ave., Ann Arbor, MI 48109 ; Department of Electrical Engineering and Computer Science, University of Michigan Solid State Electronics Laboratory, 1301 Beal Ave., Ann Arbor, MI 48109.en_US
dc.contributor.affiliationotherMassachusetts Institute of Technology, Department of Mechanical Engineering, 77 Massachusetts Ave., Cambridge, MA 02139en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/58080/1/1129_ftp.pdf
dc.identifier.doihttp://dx.doi.org/10.1002/adma.200700225en_US
dc.identifier.sourceAdvanced Materialsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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