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TOPICAL REVIEW: Slow light in semiconductor heterostructures

dc.contributor.authorKu, P. C.en_US
dc.contributor.authorChang-Hasnain, C. J.en_US
dc.contributor.authorChuang, S. L.en_US
dc.date.accessioned2008-04-02T14:39:22Z
dc.date.available2008-04-02T14:39:22Z
dc.date.issued2007-03-07en_US
dc.identifier.citationKu, P C; Chang-Hasnain, C J; Chuang, S L (2007). "TOPICAL REVIEW: Slow light in semiconductor heterostructures." Journal of Physics D: Applied Physics. 40(5): R93-R107. <http://hdl.handle.net/2027.42/58125>en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/58125
dc.description.abstractThis paper presents an overview of slow light in semiconductor heterostructures. The focus of this paper is to provide a unified framework to summarize and compare various physical mechanisms of slow light proposed and demonstrated in the past few years. We expand and generalize the discussions on fundamental limitation of slow light and the delay–bandwidth product trade-off to include gain systems and other mechanisms such as injection locking. We derive the maximum fractional delay and compare the differences between material dispersion and waveguide dispersion based devices. The delay–bandwidth product is proportional to the square root of the device length for a material dispersion based device but has a linear relationship for a waveguide dispersion based device. Possible scenarios to overcome the delay–bandwidth product limitation are discussed. The prospects of slow light in various applications are also investigated.en_US
dc.format.extent3118 bytes
dc.format.extent908426 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherIOP Publishing Ltden_US
dc.titleTOPICAL REVIEW: Slow light in semiconductor heterostructuresen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Av, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherDepartment of Electrical Engineering and Computer Science, University of California at Berkeley, Berkeley CA 94720, USAen_US
dc.contributor.affiliationotherDepartment of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/58125/2/d7_5_R01.pdf
dc.identifier.doihttp://dx.doi.org/10.1088/0022-3727/40/5/R01en_US
dc.identifier.sourceJournal of Physics D: Applied Physics.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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