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Optimizing the planar structure of (1 1 1) Au/Co/Au trilayers

dc.contributor.authorKumah, D. P.en_US
dc.contributor.authorCebollada, A.en_US
dc.contributor.authorClavero, C.en_US
dc.contributor.authorGarcía-Martín, J. M.en_US
dc.contributor.authorSkuza, J. R.en_US
dc.contributor.authorLukaszew, Rosa A.en_US
dc.contributor.authorClarke, Royen_US
dc.date.accessioned2008-04-02T14:42:56Z
dc.date.available2008-04-02T14:42:56Z
dc.date.issued2007-05-07en_US
dc.identifier.citationKumah, D P; Cebollada, A; Clavero, C; García-Martín, J M; Skuza, J R; Lukaszew, R A; Clarke, R (2007). "Optimizing the planar structure of (1 1 1) Au/Co/Au trilayers." Journal of Physics D: Applied Physics. 40(9): 2699-2704. <http://hdl.handle.net/2027.42/58140>en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/58140
dc.description.abstractAu/Co/Au trilayers are interesting for a range of applications which exploit their unusual optical and electronic transport behaviour in a magnetic field. Here we present a comprehensive structural and morphological study of a series of trilayers with 0–7 nm Co layer thickness fabricated on glass by ultrahigh vacuum vapour deposition. We use a combination of in situ electron diffraction, atomic force microscopy and x-ray scattering to determine the optimum deposition conditions for highly textured, flat and continuous layered structures. The 16 nm Au-on-glass buffer layer, deposited at ambient temperature, is found to develop a smooth (1 1 1) texture on annealing at 350 °C for 10 min. Subsequent growth of the Co layer at 150 °C produces a (1 1 1) textured film with lateral grain size of ∼150 nm in the 7 nm-thick Co layer. A simultaneous in-plane and out-of-plane Co lattice expansion is observed for the thinnest Co layers, converging to bulk values for the thickest films. The roughness of the Co layer is similar to that of the Au buffer layer, indicative of conformal growth. The 6 nm Au capping layer smoothens the trilayer surface, resulting in a surface roughness independent of the Co layer thickness.en_US
dc.format.extent3118 bytes
dc.format.extent1335776 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherIOP Publishing Ltden_US
dc.titleOptimizing the planar structure of (1 1 1) Au/Co/Au trilayersen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumApplied Physics Program and FOCUS Center, University of Michigan, 450 Church St., Ann Arbor, MI 48109-1040, USAen_US
dc.contributor.affiliationumApplied Physics Program and FOCUS Center, University of Michigan, 450 Church St., Ann Arbor, MI 48109-1040, USA; Instituto de Microelectrónica de Madrid-IMM (CNM-CSIC), Isaac Newton 8-PTM, 28760 Tres Cantos, Madrid, Spainen_US
dc.contributor.affiliationumApplied Physics Program and FOCUS Center, University of Michigan, 450 Church St., Ann Arbor, MI 48109-1040, USAen_US
dc.contributor.affiliationotherInstituto de Microelectrónica de Madrid-IMM (CNM-CSIC), Isaac Newton 8-PTM, 28760 Tres Cantos, Madrid, Spainen_US
dc.contributor.affiliationotherInstituto de Microelectrónica de Madrid-IMM (CNM-CSIC), Isaac Newton 8-PTM, 28760 Tres Cantos, Madrid, Spainen_US
dc.contributor.affiliationotherPhysics and Astronomy Department, University of Toledo, 2801 W. Bancroft St., Mailstop 111, Toledo, OH 43606, USAen_US
dc.contributor.affiliationotherPhysics and Astronomy Department, University of Toledo, 2801 W. Bancroft St., Mailstop 111, Toledo, OH 43606, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/58140/2/d7_9_003.pdf
dc.identifier.doihttp://dx.doi.org/10.1088/0022-3727/40/9/003en_US
dc.identifier.sourceJournal of Physics D: Applied Physics.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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