Electrically Programmable Surfaces for Configurable Patterning of Cells The authors thank Y.-W. Lin for assistance with electrode lithography. This work was supported by NSF, Yamatake Co., Japan, NIH, and an REA Fellowship from the University of Michigan (C.Y.F.).
dc.contributor.author | Fan, Chao Yung | en_US |
dc.contributor.author | Tung, Yi-Chung | en_US |
dc.contributor.author | Takayama, Shuichi | en_US |
dc.contributor.author | Meyhöfer, Edgar | en_US |
dc.contributor.author | Kurabayashi, Katsuo | en_US |
dc.date.accessioned | 2008-05-12T13:39:46Z | |
dc.date.available | 2009-05-04T19:09:21Z | en_US |
dc.date.issued | 2008-04-21 | en_US |
dc.identifier.citation | Fan, Chao Yung; Tung, Yi-Chung; Takayama, Shuichi; MeyhÖfer, Edgar; Kurabayashi, Katsuo (2008). "Electrically Programmable Surfaces for Configurable Patterning of Cells The authors thank Y.-W. Lin for assistance with electrode lithography. This work was supported by NSF, Yamatake Co., Japan, NIH, and an REA Fellowship from the University of Michigan (C.Y.F.). ." Advanced Materials 20(8): 1418-1423. <http://hdl.handle.net/2027.42/58574> | en_US |
dc.identifier.issn | 0935-9648 | en_US |
dc.identifier.issn | 1521-4095 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/58574 | |
dc.description.abstract | No Abstract. | en_US |
dc.format.extent | 329567 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | WILEY-VCH Verlag | en_US |
dc.subject.other | Chemistry | en_US |
dc.subject.other | Polymer and Materials Science | en_US |
dc.title | Electrically Programmable Surfaces for Configurable Patterning of Cells The authors thank Y.-W. Lin for assistance with electrode lithography. This work was supported by NSF, Yamatake Co., Japan, NIH, and an REA Fellowship from the University of Michigan (C.Y.F.). | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Engineering (General) | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, 48109-2125 MI (USA) | en_US |
dc.contributor.affiliationum | Department of Biomedical Engineering, University of Michigan, Ann Arbor, 48109-2099 MI (USA) | en_US |
dc.contributor.affiliationum | Department of Biomedical Engineering, University of Michigan, Ann Arbor, 48109-2099 MI (USA) | en_US |
dc.contributor.affiliationum | Department of Mechanical Engineering, University of Michigan, Ann Arbor, 48109-2125 MI (USA) ; Department of Mechanical Engineering, University of Michigan, Ann Arbor, 48109-2125 MI (USA). | en_US |
dc.contributor.affiliationum | Department of Mechanical Engineering, University of Michigan, Ann Arbor, 48109-2125 MI (USA) ; Department of Mechanical Engineering, University of Michigan, Ann Arbor, 48109-2125 MI (USA). | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/58574/1/1418_ftp.pdf | |
dc.identifier.doi | http://dx.doi.org/10.1002/adma.200702191 | en_US |
dc.identifier.source | Advanced Materials | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.