Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography
dc.contributor.author | Ro, Hyun Wook | en_US |
dc.contributor.author | Peng, Huagen | en_US |
dc.contributor.author | Niihara, Ken-ichi | en_US |
dc.contributor.author | Lee, Hae-Jeong | en_US |
dc.contributor.author | Lin, Eric K. | en_US |
dc.contributor.author | Karim, Alamgir | en_US |
dc.contributor.author | Gidley, David W. | en_US |
dc.contributor.author | Jinnai, Hiroshi | en_US |
dc.contributor.author | Yoon, Do Y. | en_US |
dc.contributor.author | Soles, Christopher L. | en_US |
dc.date.accessioned | 2008-06-04T14:38:59Z | |
dc.date.available | 2009-06-01T20:08:52Z | en_US |
dc.date.issued | 2008-05-19 | en_US |
dc.identifier.citation | Ro, Hyun Wook; Peng, Huagen; Niihara, Ken-ichi; Lee, Hae-Jeong; Lin, Eric K.; Karim, Alamgir; Gidley, David W.; Jinnai, Hiroshi; Yoon, Do Y.; Soles, Christopher L. (2008). "Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography Official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. This work is supported in part by NIST Office of Microelectronic Program, University of Michigan, the System IC 2010 Project of Korea, and the Chemistry and Molecular Engineering Program of Brain Korea 21 Project. We also acknowledge the Nanofabrication Laboratory of the Center for Nanoscale Science and Technology (CNST) in NIST for providing facilities for the NIL process. ." Advanced Materials 20(10): 1934-1939. <http://hdl.handle.net/2027.42/58644> | en_US |
dc.identifier.issn | 0935-9648 | en_US |
dc.identifier.issn | 1521-4095 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/58644 | |
dc.description.abstract | No Abstract. | en_US |
dc.format.extent | 288585 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | WILEY-VCH Verlag | en_US |
dc.subject.other | Chemistry | en_US |
dc.subject.other | Polymer and Materials Science | en_US |
dc.title | Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Engineering (General) | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan Ann Arbor, MI 48109 (USA) | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan Ann Arbor, MI 48109 (USA) | en_US |
dc.contributor.affiliationother | NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA) | en_US |
dc.contributor.affiliationother | Department of Polymer Science and Engineering Kyoto Institute of Technology Kyoto 606-8585 (Japan) | en_US |
dc.contributor.affiliationother | NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA) | en_US |
dc.contributor.affiliationother | NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA) | en_US |
dc.contributor.affiliationother | NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA) | en_US |
dc.contributor.affiliationother | Department of Polymer Science and Engineering Kyoto Institute of Technology Kyoto 606-8585 (Japan) | en_US |
dc.contributor.affiliationother | Department of Chemistry, Seoul National University Seoul 151-747 (Korea) | en_US |
dc.contributor.affiliationother | NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA) ; NIST Polymers Division 100 Bureau Drive, stop 8541, Gaithersburg, MD 20899 (USA). | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/58644/1/1934_ftp.pdf | |
dc.identifier.doi | http://dx.doi.org/10.1002/adma.200701994 | en_US |
dc.identifier.source | Advanced Materials | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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