A Desktop Reactor for Plasma-Enhanced Growth of Carbon Nanotubes
dc.contributor.author | Nicholson, Kyler | |
dc.contributor.author | Taphouse, John | |
dc.contributor.author | Viswanathan, Janani | |
dc.contributor.author | Yamasaki, Bryan | |
dc.contributor.advisor | Hart, John | |
dc.date.accessioned | 2009-05-29T20:54:17Z | |
dc.date.available | 2009-05-29T20:54:17Z | |
dc.date.issued | 2008-12 | |
dc.identifier.uri | https://hdl.handle.net/2027.42/62490 | |
dc.description | Final report of Team 23 of ME450, Fall 2008 semester. | en |
dc.description.abstract | There are many potential applications for vertically aligned carbon nanotubes (CNTs), including various microelectronic and micromechanical devices. Vertically aligned CNTs, especially single isolated CNTs, cannot be consistently grown using pure thermal chemical vapor deposition (CVD) system. However, recent research suggests that the addition of plasma to CVD systems can greatly enhance the probability of growing vertical CNTs. | en |
dc.description.sponsorship | John Hart, Michael Fl de Volder, Eric Meshot (Mechanical Engineering, U of M) | en |
dc.format.extent | 2116849 bytes | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_US | en |
dc.subject | ME450 | en |
dc.subject | F08 | en |
dc.subject | Nanotube | en |
dc.subject | Reactor | en |
dc.title | A Desktop Reactor for Plasma-Enhanced Growth of Carbon Nanotubes | en |
dc.type | Project | en |
dc.subject.hlbsecondlevel | Mechanical Engineering | |
dc.subject.hlbtoplevel | Engineering | |
dc.contributor.affiliationum | Students | en |
dc.contributor.affiliationumcampus | Ann Arbor | |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/62490/1/ME450 Fall2008 Final Report - Team 23 - PECVD Desktop Reactor.pdf | |
dc.owningcollname | Mechanical Engineering, Department of |
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