Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27
dc.contributor.author | Yang, Yang | en_US |
dc.contributor.author | Strobel, Mark | en_US |
dc.contributor.author | Kirk, Seth | en_US |
dc.contributor.author | Kushner, Mark J. | en_US |
dc.date.accessioned | 2010-03-01T20:21:18Z | |
dc.date.available | 2011-02-01T20:36:36Z | en_US |
dc.date.issued | 2010-02-22 | en_US |
dc.identifier.citation | Yang, Yang; Strobel, Mark; Kirk, Seth; Kushner, Mark J. (2010). "Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27 ." Plasma Processes and Polymers 7(2): 123-150. <http://hdl.handle.net/2027.42/65035> | en_US |
dc.identifier.issn | 1612-8850 | en_US |
dc.identifier.issn | 1612-8869 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/65035 | |
dc.description.abstract | The surface properties of commodity hydrocarbon polymers such as poly(propylene) (PP) can be modified by functionalization with plasma-generated radicals and ions. For example, affixing fluorine to a hydrocarbon surface lowers surface energy and increases hydrophobicity. One such process is treatment of PP films in low-pressure, capacitively coupled plasmas (CCPs) sustained in F 2 -containing gas mixtures. F atoms produced in the plasma abstract H atoms from the hydrocarbon and passivate the resulting alkyl sites producing C[bond]F n sites. Energetic ion and photon fluxes sputter and initiate crosslinking. In this paper, the plasma fluorination of PP in a CCP sustained in Ar/F 2 is discussed with results from a two-dimensional plasma hydrodynamics model. The surface reaction mechanism includes a hierarchy of H abstraction and F/F 2 passivation reactions, as well as crosslinking, and ion and photon-activated processes. Predictions for surface composition were compared to experiments. We found that the lack of total fluorination with long plasma exposure is likely caused by crosslinking, which creates C[bond]C bonds that might otherwise be passivated by F atoms. Increasing steric hindrances as fluorination proceeds also contribute to lower F/C ratios. | en_US |
dc.format.extent | 1930938 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | WILEY-VCH Verlag | en_US |
dc.subject.other | Physics | en_US |
dc.title | Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27 | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA ; Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA. | en_US |
dc.contributor.affiliationother | Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011, USA | en_US |
dc.contributor.affiliationother | Corporate Research Process Laboratory, 3M Company, 3M Center, St. Paul, Minnesota 55144, USA | en_US |
dc.contributor.affiliationother | Corporate Research Process Laboratory, 3M Company, 3M Center, St. Paul, Minnesota 55144, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/65035/1/123_ftp.pdf | |
dc.identifier.doi | 10.1002/ppap.200900114 | en_US |
dc.identifier.source | Plasma Processes and Polymers | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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