Show simple item record

Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27

dc.contributor.authorYang, Yangen_US
dc.contributor.authorStrobel, Marken_US
dc.contributor.authorKirk, Sethen_US
dc.contributor.authorKushner, Mark J.en_US
dc.date.accessioned2010-03-01T20:21:18Z
dc.date.available2011-02-01T20:36:36Zen_US
dc.date.issued2010-02-22en_US
dc.identifier.citationYang, Yang; Strobel, Mark; Kirk, Seth; Kushner, Mark J. (2010). "Fluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27 ." Plasma Processes and Polymers 7(2): 123-150. <http://hdl.handle.net/2027.42/65035>en_US
dc.identifier.issn1612-8850en_US
dc.identifier.issn1612-8869en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/65035
dc.description.abstractThe surface properties of commodity hydrocarbon polymers such as poly(propylene) (PP) can be modified by functionalization with plasma-generated radicals and ions. For example, affixing fluorine to a hydrocarbon surface lowers surface energy and increases hydrophobicity. One such process is treatment of PP films in low-pressure, capacitively coupled plasmas (CCPs) sustained in F 2 -containing gas mixtures. F atoms produced in the plasma abstract H atoms from the hydrocarbon and passivate the resulting alkyl sites producing C[bond]F n sites. Energetic ion and photon fluxes sputter and initiate crosslinking. In this paper, the plasma fluorination of PP in a CCP sustained in Ar/F 2 is discussed with results from a two-dimensional plasma hydrodynamics model. The surface reaction mechanism includes a hierarchy of H abstraction and F/F 2 passivation reactions, as well as crosslinking, and ion and photon-activated processes. Predictions for surface composition were compared to experiments. We found that the lack of total fluorination with long plasma exposure is likely caused by crosslinking, which creates C[bond]C bonds that might otherwise be passivated by F atoms. Increasing steric hindrances as fluorination proceeds also contribute to lower F/C ratios.en_US
dc.format.extent1930938 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherWILEY-VCH Verlagen_US
dc.subject.otherPhysicsen_US
dc.titleFluorine Plasma Treatments of Poly(propylene) Films, 2 – Modeling Reaction Mechanisms and Scaling Part 1: cf. ref. 27en_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA ; Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA.en_US
dc.contributor.affiliationotherDepartment of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011, USAen_US
dc.contributor.affiliationotherCorporate Research Process Laboratory, 3M Company, 3M Center, St. Paul, Minnesota 55144, USAen_US
dc.contributor.affiliationotherCorporate Research Process Laboratory, 3M Company, 3M Center, St. Paul, Minnesota 55144, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/65035/1/123_ftp.pdf
dc.identifier.doi10.1002/ppap.200900114en_US
dc.identifier.sourcePlasma Processes and Polymersen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.