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Kinetics of Β-Si 3 N 4 Grain Growth in Si 3 N 4 Ceramics Sintered under High Nitrogen Pressure

dc.contributor.authorLai, Kou-Ruehen_US
dc.contributor.authorTien, Tseng-Yingen_US
dc.date.accessioned2010-04-01T15:11:10Z
dc.date.available2010-04-01T15:11:10Z
dc.date.issued1993-01en_US
dc.identifier.citationLai, Kou-Rueh; Tien, Tseng-Ying (1993). "Kinetics of Β-Si 3 N 4 Grain Growth in Si 3 N 4 Ceramics Sintered under High Nitrogen Pressure." Journal of the American Ceramic Society 76(1): 91-96. <http://hdl.handle.net/2027.42/65654>en_US
dc.identifier.issn0002-7820en_US
dc.identifier.issn1551-2916en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/65654
dc.format.extent699258 bytes
dc.format.extent3110 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherBlackwell Publishing Ltden_US
dc.rights1993 by The American Ceramic Societyen_US
dc.titleKinetics of Β-Si 3 N 4 Grain Growth in Si 3 N 4 Ceramics Sintered under High Nitrogen Pressureen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumMaterials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/65654/1/j.1151-2916.1993.tb03693.x.pdf
dc.identifier.doi10.1111/j.1151-2916.1993.tb03693.xen_US
dc.identifier.sourceJournal of the American Ceramic Societyen_US
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dc.owningcollnameInterdisciplinary and Peer-Reviewed


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