Determination of pore-size distribution in low-dielectric thin films
dc.contributor.author | Gidley, David W. | en_US |
dc.contributor.author | Frieze, William E. | en_US |
dc.contributor.author | Dull, Terry L. | en_US |
dc.contributor.author | Sun, J. | en_US |
dc.contributor.author | Yee, Albert F. | en_US |
dc.contributor.author | Nguyen, C. V. | en_US |
dc.contributor.author | Yoon, Do Y. | en_US |
dc.date.accessioned | 2010-05-06T20:32:33Z | |
dc.date.available | 2010-05-06T20:32:33Z | |
dc.date.issued | 2000-03-06 | en_US |
dc.identifier.citation | Gidley, D. W.; Frieze, W. E.; Dull, T. L.; Sun, J.; Yee, A. F.; Nguyen, C. V.; Yoon, D. Y. (2000). "Determination of pore-size distribution in low-dielectric thin films." Applied Physics Letters 76(10): 1282-1284. <http://hdl.handle.net/2027.42/69398> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/69398 | |
dc.description.abstract | Positronium annihilation lifetime spectroscopy is used to determine the pore-size distribution in low-dielectric thin films of mesoporous methylsilsesquioxane. A physical model of positronium trapping and annihilating in isolated pores is presented. The systematic dependence of the deduced pore-size distribution on pore shape/dimensionality and sample temperature is predicted using a simple quantum mechanical calculation of positronium annihilation in a rectangular pore. A comparison with an electron microscope image is presented. © 2000 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 52962 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Determination of pore-size distribution in low-dielectric thin films | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationother | IBM Almaden Research Center, San Jose, California 95120 | en_US |
dc.contributor.affiliationother | Department of Chemistry, Seoul National University, Seoul 151-742, Korea | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/69398/2/APPLAB-76-10-1282-1.pdf | |
dc.identifier.doi | 10.1063/1.126009 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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dc.owningcollname | Physics, Department of |
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