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Determination of pore-size distribution in low-dielectric thin films

dc.contributor.authorGidley, David W.en_US
dc.contributor.authorFrieze, William E.en_US
dc.contributor.authorDull, Terry L.en_US
dc.contributor.authorSun, J.en_US
dc.contributor.authorYee, Albert F.en_US
dc.contributor.authorNguyen, C. V.en_US
dc.contributor.authorYoon, Do Y.en_US
dc.date.accessioned2010-05-06T20:32:33Z
dc.date.available2010-05-06T20:32:33Z
dc.date.issued2000-03-06en_US
dc.identifier.citationGidley, D. W.; Frieze, W. E.; Dull, T. L.; Sun, J.; Yee, A. F.; Nguyen, C. V.; Yoon, D. Y. (2000). "Determination of pore-size distribution in low-dielectric thin films." Applied Physics Letters 76(10): 1282-1284. <http://hdl.handle.net/2027.42/69398>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69398
dc.description.abstractPositronium annihilation lifetime spectroscopy is used to determine the pore-size distribution in low-dielectric thin films of mesoporous methylsilsesquioxane. A physical model of positronium trapping and annihilating in isolated pores is presented. The systematic dependence of the deduced pore-size distribution on pore shape/dimensionality and sample temperature is predicted using a simple quantum mechanical calculation of positronium annihilation in a rectangular pore. A comparison with an electron microscope image is presented. © 2000 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent52962 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleDetermination of pore-size distribution in low-dielectric thin filmsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Physics, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherIBM Almaden Research Center, San Jose, California 95120en_US
dc.contributor.affiliationotherDepartment of Chemistry, Seoul National University, Seoul 151-742, Koreaen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69398/2/APPLAB-76-10-1282-1.pdf
dc.identifier.doi10.1063/1.126009en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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