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Epitaxial growth of the first five members of the Srn+1TinO3n+1Srn+1TinO3n+1 Ruddlesden–Popper homologous series

dc.contributor.authorHaeni, J. H.en_US
dc.contributor.authorTheis, Chris D.en_US
dc.contributor.authorSchlom, Darrell G.en_US
dc.contributor.authorTian, Weien_US
dc.contributor.authorPan, Xiaoqingen_US
dc.contributor.authorChang, H.en_US
dc.contributor.authorTakeuchi, I.en_US
dc.contributor.authorXiang, X.-D.en_US
dc.date.accessioned2010-05-06T20:36:33Z
dc.date.available2010-05-06T20:36:33Z
dc.date.issued2001-05-21en_US
dc.identifier.citationHaeni, J. H.; Theis, C. D.; Schlom, D. G.; Tian, W.; Pan, X. Q.; Chang, H.; Takeuchi, I.; Xiang, X.-D. (2001). "Epitaxial growth of the first five members of the Srn+1TinO3n+1Srn+1TinO3n+1 Ruddlesden–Popper homologous series." Applied Physics Letters 78(21): 3292-3294. <http://hdl.handle.net/2027.42/69442>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69442
dc.description.abstractThe first five members of the Srn+1TinO3n+1Srn+1TinO3n+1 Ruddlesden–Popper homologous series, i.e., Sr2TiO4,Sr2TiO4, Sr3Ti2O7,Sr3Ti2O7, Sr4Ti3O10,Sr4Ti3O10, Sr5Ti4O13,Sr5Ti4O13, and Sr6Ti5O16,Sr6Ti5O16, have been grown by reactive molecular beam epitaxy. A combination of atomic absorption spectroscopy and reflection high-energy electron diffraction intensity oscillations were used for the strict composition control necessary for the synthesis of these phases. X-ray diffraction and high-resolution transmission electron microscope images confirm that these films are epitaxially oriented and nearly free of intergrowths. Dielectric measurements indicate that the dielectric constant tensor coefficient ϵ33ϵ33 increases from a minimum of 44±444±4 in the n = 1(Sr2TiO4)n=1(Sr2TiO4) film to a maximum of 263±2263±2 in the n = ∞(SrTiO3)n=∞(SrTiO3) film. © 2001 American Institute of Physics.en_US
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleEpitaxial growth of the first five members of the Srn+1TinO3n+1Srn+1TinO3n+1 Ruddlesden–Popper homologous seriesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109-2136en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802-5005en_US
dc.contributor.affiliationotherMaterials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69442/2/APPLAB-78-21-3292-1.pdf
dc.identifier.doi10.1063/1.1371788en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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