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Laser‐induced breakdown by impact ionization in SiO2 with pulse widths from 7 ns to 150 fs

dc.contributor.authorDu, D.en_US
dc.contributor.authorLiu, X.en_US
dc.contributor.authorKorn, G.en_US
dc.contributor.authorSquier, Jeffen_US
dc.contributor.authorMourou, Gerard A.en_US
dc.date.accessioned2010-05-06T20:44:38Z
dc.date.available2010-05-06T20:44:38Z
dc.date.issued1994-06-06en_US
dc.identifier.citationDu, D.; Liu, X.; Korn, G.; Squier, J.; Mourou, G. (1994). "Laser‐induced breakdown by impact ionization in SiO2 with pulse widths from 7 ns to 150 fs." Applied Physics Letters 64(23): 3071-3073. <http://hdl.handle.net/2027.42/69530>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69530
dc.description.abstractResults of laser‐induced breakdown experiments in fused silica (SiO2) employing 150 fs–7 ns, 780 nm laser pulses are reported. The avalanche ionization mechanism is found to dominate over the entire pulse‐width range. Fluence breakdown threshold does not follow the scaling of Fth∼ √τp, when pulses are shorter than 10 ps. The impact ionization coefficient of SiO2 is measured up to ∼3×108 V/cm. The relative role of photoionization in breakdown for ultrashort pulses is discussed.en_US
dc.format.extent3102 bytes
dc.format.extent401956 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleLaser‐induced breakdown by impact ionization in SiO2 with pulse widths from 7 ns to 150 fsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109‐2099en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69530/2/APPLAB-64-23-3071-1.pdf
dc.identifier.doi10.1063/1.111350en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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