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Direct Evidence of the Interaction of Domains with Atomic Scale Imperfections in GdIG

dc.contributor.authorNelson, Thomas J.en_US
dc.date.accessioned2010-05-06T21:10:52Z
dc.date.available2010-05-06T21:10:52Z
dc.date.issued1969-03-01en_US
dc.identifier.citationNelson, Thomas J. (1969). "Direct Evidence of the Interaction of Domains with Atomic Scale Imperfections in GdIG." Journal of Applied Physics 40(3): 1096-1096. <http://hdl.handle.net/2027.42/69807>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69807
dc.description.abstractOptical observations of the interaction of domains with atomic scale imperfections are presented. Thin transparent {100} orientation wafers of GdIG are prepared from 20 mil‐thick slabs by chemical polishing, and in this process etch pits develop which reveal line imperfections in the crystal. These may be individual dislocation lines or other minor structural defects. Domains are both pinned and nucleated at these lines. Interesting cooperative effects occur when a number of lines can be identified in the same sample. It is often observed, for example, that nucleation and initial domain growth take place on the same side of all the lines. In some cases a small residual domain near a line imperfection appears to influence the domain structure throughout the sample, and has the effect of favoring one saturated remanent state over the other. When the residual domain collapses, the effect disappears. Magnetostrictive stress between the domain and the rest of the sample may be responsible for this behavior.en_US
dc.format.extent3102 bytes
dc.format.extent62988 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleDirect Evidence of the Interaction of Domains with Atomic Scale Imperfections in GdIGen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumThe University of Michigan, Department of Electrical Engineering, Electron Physics Laboratory, Ann Arbor, Michigan 48104en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69807/2/JAPIAU-40-3-1096-1.pdf
dc.identifier.doi10.1063/1.1657540en_US
dc.identifier.sourceJournal of Applied Physicsen_US
dc.owningcollnamePhysics, Department of


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