An infrared study of H8Si8O12H8Si8O12 cluster adsorption on Si(100) surfaces
dc.contributor.author | Eng, Joseph | en_US |
dc.contributor.author | Raghavachari, Krishnan | en_US |
dc.contributor.author | Struck, Lisa M. | en_US |
dc.contributor.author | Chabal, Yves J. | en_US |
dc.contributor.author | Bent, Brian E. | en_US |
dc.contributor.author | Banaszak Holl, Mark M. | en_US |
dc.contributor.author | McFeely, F. R. | en_US |
dc.contributor.author | Michaels, Amy M. | en_US |
dc.contributor.author | Flynn, George W. | en_US |
dc.contributor.author | Christman, Stan B. | en_US |
dc.contributor.author | Chaban, Ed E. | en_US |
dc.contributor.author | Williams, Gwyn P. | en_US |
dc.contributor.author | Radermacher, Klaus | en_US |
dc.contributor.author | Mantl, Siegfried | en_US |
dc.date.accessioned | 2010-05-06T21:11:52Z | |
dc.date.available | 2010-05-06T21:11:52Z | |
dc.date.issued | 1998-05-22 | en_US |
dc.identifier.citation | Eng, Joseph; Raghavachari, Krishnan; Struck, Lisa M.; Chabal, Yves J.; Bent, Brian E.; Banaszak-Holl, Mark M.; McFeely, F. R.; Michaels, Amy M.; Flynn, George W.; Christman, Stan B.; Chaban, Ed E.; Williams, Gwyn P.; Radermacher, Klaus; Mantl, Siegfried (1998). "An infrared study of H8Si8O12H8Si8O12 cluster adsorption on Si(100) surfaces." The Journal of Chemical Physics 108(20): 8680-8688. <http://hdl.handle.net/2027.42/69818> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/69818 | |
dc.description.abstract | Motivated by a controversy about the proper interpretation of x-ray photoelectron spectra of Si/SiO2Si/SiO2 interfaces derived from the adsorption of H8Si8O12H8Si8O12 spherosiloxane clusters on Si(100) surfaces, we have studied the adsorption geometry of the H8Si8O12H8Si8O12 clusters on deuterium-passivated and clean Si(100) surfaces by using external reflection infrared spectroscopy. Access to frequencies below 1450 cm−11450cm−1 was made possible through the use of specially prepared Si(100) samples which have a buried metallic CoSi2CoSi2 layer that acts as an internal mirror. A comparison of the infrared spectrum of the clusters on a deuterium-passivated Si(100) surface at 130 K with an infrared spectrum of the clusters in a carbon tetrachloride solution reveals that the clusters are only weakly physisorbed on the D/Si(100) surface and also provides evidence for the purity of the cluster source. We also present infrared spectra of clusters directly chemisorbed on a clean Si(100) surface and show evidence that the clusters are adsorbed on the Si(100) via attachment by one vertex. A complete assignment of the observed vibrational features, for both physisorbed and chemisorbed clusters, has been made based upon comparisons with the results obtained in ab initio calculations using gradient-corrected density functional methods. © 1998 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 158762 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | An infrared study of H8Si8O12H8Si8O12 cluster adsorption on Si(100) surfaces | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Chemistry, University of Michigan, Ann Arbor, Michigan 48109-1055 | en_US |
dc.contributor.affiliationother | Department of Chemistry and Columbia Radiation Laboratory, Columbia University, New York, New York 10027 | en_US |
dc.contributor.affiliationother | Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974 | en_US |
dc.contributor.affiliationother | Department of Chemistry and Columbia Radiation Laboratory, Columbia University, New York, New York 10027 | en_US |
dc.contributor.affiliationother | Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974 | en_US |
dc.contributor.affiliationother | Department of Chemistry and Columbia Radiation Laboratory, Columbia University, New York, New York 10027 | en_US |
dc.contributor.affiliationother | IBM T. J. Watson Research Laboratories, Yorktown Heights, New York 10598 | en_US |
dc.contributor.affiliationother | Department of Chemistry and Columbia Radiation Laboratory, Columbia University, New York, New York 10027 | en_US |
dc.contributor.affiliationother | Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974 | en_US |
dc.contributor.affiliationother | National Synchrotron Light Source, Brookhaven National Laboratory, Upton, New York 11973 | en_US |
dc.contributor.affiliationother | Institut für Schicht-und Ionentechnik, Forschungszentrum Jülich W-5170, Jülich, Germany | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/69818/2/JCPSA6-108-20-8680-1.pdf | |
dc.identifier.doi | 10.1063/1.476411 | en_US |
dc.identifier.source | The Journal of Chemical Physics | en_US |
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dc.owningcollname | Physics, Department of |
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