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Site symmetry analysis of the 738 nm defect in diamond
dc.contributor.authorBrown, S. W.en_US
dc.contributor.authorRand, Stephen C.en_US
dc.date.accessioned2010-05-06T21:12:31Z
dc.date.available2010-05-06T21:12:31Z
dc.date.issued1995-09-15en_US
dc.identifier.citationBrown, S. W.; Rand, S. C. (1995). "Site symmetry analysis of the 738 nm defect in diamond." Journal of Applied Physics 78(6): 4069-4075. <http://hdl.handle.net/2027.42/69825>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69825
dc.description.abstractBased on a detailed analysis of polarized Raman and luminescence measurements of a ‘‘mosaic’’ diamond film, symmetry properties of a ubiquitous point defect observed in diamond films are determined. Specifically, the defect, which gives rise to emission at 738 nm, is determined unequivocally to be a ⟨110⟩‐oriented defect with the transition dipole moment of the center oriented along the ⟨110⟩ symmetry axis. These results represent the first analysis of the symmetry properties of this point defect and aid in the development of structural model of the center. © 1995 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent958057 bytes
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dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleSite symmetry analysis of the 738 nm defect in diamonden_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDivision of Applied Physics, 1049 Randall Laboratory, The University of Michigan, Ann Arbor, Michigan 48109‐1120en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69825/2/JAPIAU-78-6-4069-1.pdf
dc.identifier.doi10.1063/1.359864en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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