Profiling and modeling of dc nitrogen microplasmas
dc.contributor.author | Wilson, Chester G. | en_US |
dc.contributor.author | Gianchandani, Yogesh B. | en_US |
dc.contributor.author | Arslanbekov, Robert R. | en_US |
dc.contributor.author | Kolobov, Vladimir | en_US |
dc.contributor.author | Wendt, Amy E. | en_US |
dc.date.accessioned | 2010-05-06T21:17:18Z | |
dc.date.available | 2010-05-06T21:17:18Z | |
dc.date.issued | 2003-09-01 | en_US |
dc.identifier.citation | Wilson, Chester G.; Gianchandani, Yogesh B.; Arslanbekov, Robert R.; Kolobov, Vladimir; Wendt, Amy E. (2003). "Profiling and modeling of dc nitrogen microplasmas." Journal of Applied Physics 94(5): 2845-2851. <http://hdl.handle.net/2027.42/69877> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/69877 | |
dc.description.abstract | This article explores electric current and field distributions in dc microplasmas, which have distinctive characteristics that are not evident at larger dimensions. These microplasmas, which are powered by coplanar thin-film metal electrodes with 400-μm minimum separations on a glass substrate, are potentially useful for microsystems in both sensing and microfabrication contexts. Experiments in N2N2 ambient show that electron current favors electrode separations of 4 mm at 1.2 Torr, reducing to 0.4 mm at 10 Torr. The glow region is confined directly above the cathode, and within 200–500 μm of its lateral edge. Voltage gradients of 100 kV/m exist in this glow region at 1.2 Torr, increasing to 500 kV/m at 6 Torr, far in excess of those observed in larger plasmas. Numerical simulations indicate that the microplasmas are highly nonquasineutral, with a large ion density proximate to the cathode, responsible for a dense space-charge region, and the strong electric fields in the glow region. It is responsible for the bulk of the ionization and has a bimodal electron energy distribution function, with a local peak at 420 eV. © 2003 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 755572 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Profiling and modeling of dc nitrogen microplasmas | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | EECS Department, University of Michigan, Ann Arbor, Michigan | en_US |
dc.contributor.affiliationother | Department of Electrical and Computer Engineering, University of Wisconsin, Madison, Wisconsin | en_US |
dc.contributor.affiliationother | CFD Research Corp., Huntsville, Alabama | en_US |
dc.contributor.affiliationother | Department of Electrical and Computer Engineering, University of Wisconsin, Madison, Wisconsin | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/69877/2/JAPIAU-94-5-2845-1.pdf | |
dc.identifier.doi | 10.1063/1.1595143 | en_US |
dc.identifier.source | Journal of Applied Physics | en_US |
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dc.owningcollname | Physics, Department of |
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