Origins of luminescence from nitrogen-ion-implanted epitaxial GaAsGaAs
dc.contributor.author | Weng, X. | en_US |
dc.contributor.author | Goldman, R. S. | en_US |
dc.contributor.author | Rotberg, V. H. (Victor H.) | en_US |
dc.contributor.author | Bataiev, N. | en_US |
dc.contributor.author | Brillson, L. J. | en_US |
dc.date.accessioned | 2010-05-06T21:23:19Z | |
dc.date.available | 2010-05-06T21:23:19Z | |
dc.date.issued | 2004-10-04 | en_US |
dc.identifier.citation | Weng, X.; Goldman, R. S.; Rotberg, V.; Bataiev, N.; Brillson, L. J. (2004). "Origins of luminescence from nitrogen-ion-implanted epitaxial GaAsGaAs." Applied Physics Letters 85(14): 2774-2776. <http://hdl.handle.net/2027.42/69942> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/69942 | |
dc.description.abstract | We have examined the origins of luminescence in N-ion-implanted epitaxial GaAsGaAs, using a combination of cross-sectional transmission electron microscopy and low-energy electron-excited nanoscale-luminescence spectroscopy. A comparison of reference, as-implanted, and implanted-plus-annealed samples reveals a variety of emissions. In all samples, we observe the GaAsGaAs fundamental band-gap emission, as well as several emissions related to GaAsGaAs native defects. In the as-implanted and implanted-plus-annealed samples, an emission related to the implantation-induced defects, is also observed. Interestingly, in the implanted-plus-annealed samples, we identify a near-infrared emission associated with GaAsNGaAsN nanocrystallites. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 178088 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/octet-stream | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Origins of luminescence from nitrogen-ion-implanted epitaxial GaAsGaAs | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationother | Department of Electrical Engineering, Ohio State University, Columbus, Ohio 43210-1272 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/69942/2/APPLAB-85-14-2774-1.pdf | |
dc.identifier.doi | 10.1063/1.1803940 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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dc.owningcollname | Physics, Department of |
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