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Use of magnetocrystalline anisotropy in spin-dependent tunneling

dc.contributor.authorLukaszew, Rosa A.en_US
dc.contributor.authorSheng, Yongningen_US
dc.contributor.authorUher, Ctiraden_US
dc.contributor.authorClarke, Royen_US
dc.date.accessioned2010-05-06T21:27:41Z
dc.date.available2010-05-06T21:27:41Z
dc.date.issued1999-09-27en_US
dc.identifier.citationLukaszew, R. A.; Sheng, Y.; Uher, C.; Clarke, R. (1999). "Use of magnetocrystalline anisotropy in spin-dependent tunneling." Applied Physics Letters 75(13): 1941-1943. <http://hdl.handle.net/2027.42/69989>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69989
dc.description.abstractEpitaxial growth techniques are used to impose in-plane magnetocrystalline anisotropy on a spin-polarized tunneling configuration. A Cu(100) buffer layer grown on a Si(100) substrate stabilizes epitaxial face-centered-cubic cobalt as one of the ferromagnetic electrodes. The negative magnetocrystalline constant of this metastable phase favors easy axes along Co ⟨110⟩ and, due to the single crystal nature of this layer, the coercivity is more than an order of magnitude larger than in the polycrystalline layers which form the second electrode. Our approach provides a way to access the high degree of spin polarization characteristic of the 3d3d transition metals. © 1999 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent170026 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleUse of magnetocrystalline anisotropy in spin-dependent tunnelingen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumRandall Laboratory of Physics, University of Michigan, Ann Arbor, Michigan 48109-1120en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69989/2/APPLAB-75-13-1941-1.pdf
dc.identifier.doi10.1063/1.124878en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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