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Characteristics of Rotationally Stabilized Long Plasma Arcs in a Chamber
dc.contributor.authorYeh, Hsu‐chiehen_US
dc.contributor.authorYang, Wen‐jeien_US
dc.date.accessioned2010-05-06T21:29:55Z
dc.date.available2010-05-06T21:29:55Z
dc.date.issued1969-08en_US
dc.identifier.citationYeh, Hsu‐Chieh; Yang, Wen‐Jei (1969). "Characteristics of Rotationally Stabilized Long Plasma Arcs in a Chamber." Journal of Applied Physics 40(9): 3687-3693. <http://hdl.handle.net/2027.42/70013>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70013
dc.description.abstractAn analytical method is developed to determine the gas temperature distribution and the electric field strength‐arc length characteristics of a rotationally stabilized long plasma arc in a cylindrical chamber. The application of the method was demonstrated by numerical computations which were carried out for a monatomic hydrogen arc stabilized in a very large chamber. The relationships among the electric field strength, current, arc length, and arc‐axis temperature are disclosed.en_US
dc.format.extent3102 bytes
dc.format.extent438479 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleCharacteristics of Rotationally Stabilized Long Plasma Arcs in a Chamberen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Mechanical Engineering, The University of Michigan, Ann Arbor, Michigan 48104en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70013/2/JAPIAU-40-9-3687-1.pdf
dc.identifier.doi10.1063/1.1658258en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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