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Thermophysical effects in laser processing of materials with picosecond and femtosecond pulses

dc.contributor.authorPronko, P. P.en_US
dc.contributor.authorDutta, S. K.en_US
dc.contributor.authorDu, D.en_US
dc.contributor.authorSingh, R. K.en_US
dc.date.accessioned2010-05-06T21:40:25Z
dc.date.available2010-05-06T21:40:25Z
dc.date.issued1995-11-15en_US
dc.identifier.citationPronko, P. P.; Dutta, S. K.; Du, D.; Singh, R. K. (1995). "Thermophysical effects in laser processing of materials with picosecond and femtosecond pulses." Journal of Applied Physics 78(10): 6233-6240. <http://hdl.handle.net/2027.42/70126>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70126
dc.description.abstractApplication of picosecond and femtosecond laser pulses to the controlled ablation of materials represents a relatively unexplored yet important topic in laser processing. Such ultrashort pulses are of potential value in areas of thin‐film deposition, micromachining, and surgical procedures. We report here some early results of systematic studies being done from the femtosecond to the nanosecond regime, as an assessment of the problems and benefits associated with various laser pulse durations and their use in processing optically absorbing media. Experimental data and theoretical results of computer simulations are presented and compared for the threshold energies of ablation in gold as a function of pulse width from 10 ns to 100 fs. This work is then extended to include further numerically computed results for gold and silicon on ablation rates, threshold surface temperatures, liquid thicknesses, and vaporization rates as a function of pulse duration throughout the ultrafast regime from tens of femtoseconds to a few hundred picoseconds. © 1995 American Institute of Physics.en_US
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dc.format.extent1162063 bytes
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleThermophysical effects in laser processing of materials with picosecond and femtosecond pulsesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70126/2/JAPIAU-78-10-6233-1.pdf
dc.identifier.doi10.1063/1.360570en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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