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Effects of biaxial strain on the intervalence‐band absorption spectra of InGaAs/InP systems

dc.contributor.authorAfzali‐kushaa, A.en_US
dc.contributor.authorHaddad, George I.en_US
dc.date.accessioned2010-05-06T21:46:12Z
dc.date.available2010-05-06T21:46:12Z
dc.date.issued1995-06-15en_US
dc.identifier.citationAfzali‐Kushaa, A.; Haddad, G. I. (1995). "Effects of biaxial strain on the intervalence‐band absorption spectra of InGaAs/InP systems." Journal of Applied Physics 77(12): 6549-6556. <http://hdl.handle.net/2027.42/70188>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70188
dc.description.abstractThe effects of biaxial strain on the intervalence‐band absorption spectra of p‐doped InGaAs/InP bulk layers are investigated. The study is performed by calculating and comparing the absorption coefficients corresponding to the direct transitions between the heavy and light hole bands, between the heavy hole and split‐off bands, and between the split‐off and light hole bands in both the lattice matched and the strained layers. The valence‐band structures of these layers are neither isotropic nor parabolic and hence the k⋅p approach is utilized to calculate the band structures and their corresponding wave functions. The quantities are then invoked in the calculation of the (joint) density of states, the Fermi energy, and the momentum matrix element, which are needed in the evaluation of the intervalence‐band absorption coefficients. These calculated results show that the intervalence‐band absorption coefficients depend on the strain in the layer. The dependence is determined by the bands involved in the intervalence transition, the polarization of the incident light, and the type of the strain (compressive or tensile). © 1995 American Institute of Physics.en_US
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dc.format.extent997686 bytes
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleEffects of biaxial strain on the intervalence‐band absorption spectra of InGaAs/InP systemsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumSolid‐State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70188/2/JAPIAU-77-12-6549-1.pdf
dc.identifier.doi10.1063/1.359064en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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