A combined continuous‐wave and pulsed microwave copper chloride discharge
dc.contributor.author | McColl, W. B. | en_US |
dc.contributor.author | Passow, Michael L. | en_US |
dc.contributor.author | Brake, Mary L. | en_US |
dc.date.accessioned | 2010-05-06T21:53:50Z | |
dc.date.available | 2010-05-06T21:53:50Z | |
dc.date.issued | 1992-02 | en_US |
dc.identifier.citation | McColl, W.; Passow, M.; Brake, M. L. (1992). "A combined continuous‐wave and pulsed microwave copper chloride discharge." Review of Scientific Instruments 63(2): 1792-1797. <http://hdl.handle.net/2027.42/70269> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70269 | |
dc.description.abstract | Pulsed and continuous‐wave microwaves at 2.45 GHz combined in an Asmussen resonant cavity are used to vaporize, dissociate, and excite copper chloride discharges. Steady state microwaves from 50 to 150 W sustain a microwave discharge which heats and dissociates the copper chloride to a sufficient vapor pressure. A variable frequency (2.45 to 2.60 GHz) pulsed microwave source with pulse widths ranging from 0.5 to 2 ms, repetition rates of 500 to 5000 Hz and a peak output power of 4,500 W then excites the copper atomic states. The two microwave signals are superimposed using a hybrid junction before input into the resonant cavity. Microwave frequencies of the pulsed portion of the signal around 2.50 GHz provided maximum absorption by the discharge. This device is being examined as a potential pump source for a copper vapor laser. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 613889 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | A combined continuous‐wave and pulsed microwave copper chloride discharge | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70269/2/RSINAK-63-2-1792-1.pdf | |
dc.identifier.doi | 10.1063/1.1143340 | en_US |
dc.identifier.source | Review of Scientific Instruments | en_US |
dc.identifier.citedreference | C. Gordon, B. Feldman, and C. Christensen, Opt. Lett. 13, 114 (1988). | en_US |
dc.identifier.citedreference | C. Christensen, W. Waynant, and B. Feldman, Appl. Phys. Lett. 46, 321 (1985). | en_US |
dc.identifier.citedreference | A. Mendelsohn, R. Normandin, S. Harris, and J. Young, Appl. Phys. Lett. 38, 603 (1981). | en_US |
dc.identifier.citedreference | J. Young, S. Harris, P. Wisoff, and A. Mendelsohn, Laser Focus 63 (1982). | en_US |
dc.identifier.citedreference | C. Christenson and R. Waynant, Appl. Phys. Lett. 41, 794 (1982). | en_US |
dc.identifier.citedreference | C. Moutoulas, M. Moisan, L. Bertrand, J. Hubert, J. Lachambre, and A. Ricard, Appl. Phys. Lett. 46, 323 (1985). | en_US |
dc.identifier.citedreference | R. G. Bosisio, C. F. Weissfloch, and M. R. Wertheimer, J. Microwave Power 7, 325 (1972). | en_US |
dc.identifier.citedreference | J. J. Kim and K. Im, IEEE J. Quantum Electron. 26, 818 (1990). | en_US |
dc.identifier.citedreference | M. J. Kushner and B. E. Warner, J. Appl. Phys. 54, 2970 (1983). | en_US |
dc.identifier.citedreference | N. M. Nerheim, J. Appl. Phys. 48, 3244 (1977). | en_US |
dc.identifier.citedreference | W. C. Kreye, Appl. Opt. 23, 108 (1984). | en_US |
dc.identifier.citedreference | W. C. Kreye and F. L. Roesler, Appl. Opt. 22, 927 (1983). | en_US |
dc.identifier.citedreference | C. J. Chen, N. M. Nerheim, and G. R. Russel, Appl. Phys. Lett. 23, 514 (1973). | en_US |
dc.identifier.citedreference | K. Srigouri and T. A. Prasada Rao, J. Appl. Phys. 65, 1438 (1989). | en_US |
dc.identifier.citedreference | J. Asmussen, R. Mallavarpu, J. Hamann, and H. Park, Proc. IEEE 62, 109 (1974). | en_US |
dc.identifier.citedreference | R. Mallavarpu, J. Asmussen, and M. C. Hawley, IEEE Trans. Plasma Sci. PS 6, 341 (1978). | en_US |
dc.identifier.citedreference | W. McColI, M. S. thesis, University of Michigan, 1990. | en_US |
dc.identifier.citedreference | M. L. Passow, M. L. Brake, P. Lopez, W. McColl, and T. Repetti, IEEE Trans. Plasma Sci. 19, 219 (1991). | en_US |
dc.identifier.citedreference | R. H. Perry and C. H. Chilton, Chemical Engineers’ Handbook, 5th ed. (McGraw-Hill, New York, 1973). | en_US |
dc.identifier.citedreference | J. G. Eden and B. E. Cherrington, J. Appl. Phys. 44, 4920 (1973). | en_US |
dc.identifier.citedreference | American Institute of Physics, 2nd ed., edited by D. E. Gray (McGraw-Hill, New York, 1963). | en_US |
dc.identifier.citedreference | A. B. Cambel, Plasma Physics and Magnetofluidmechanics (McGraw-Hill, New York, 1963). | en_US |
dc.identifier.citedreference | S. J. Buchsbaum and S. C. Brown, Phys. Rev. 106, 196 (1957). | en_US |
dc.identifier.citedreference | K. B. Persson, Phys. Rev. 106, 191 (1957). | en_US |
dc.identifier.citedreference | S. C. Brown, Introduction to Electrical Discharges in Gases (Wiley, New York, 1966). | en_US |
dc.owningcollname | Physics, Department of |
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