Electron and hole impact ionization coefficients in GaAs‐AlxGa1−xAs superlattices
dc.contributor.author | Juang, Feng‐Yuh | en_US |
dc.contributor.author | Das, Utpal | en_US |
dc.contributor.author | Nashimoto, Yasunobu | en_US |
dc.contributor.author | Bhattacharya, Pallab K. | en_US |
dc.date.accessioned | 2010-05-06T21:57:29Z | |
dc.date.available | 2010-05-06T21:57:29Z | |
dc.date.issued | 1985-11-01 | en_US |
dc.identifier.citation | Juang, F‐Y.; Das, U.; Nashimoto, Y.; Bhattacharya, P. K. (1985). "Electron and hole impact ionization coefficients in GaAs‐AlxGa1−xAs superlattices." Applied Physics Letters 47(9): 972-974. <http://hdl.handle.net/2027.42/70308> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70308 | |
dc.description.abstract | Electron and hole multiplication and impact ionization coefficients have been measured with pure carrier injection in p+‐n−‐n+ and p+‐n diodes grown by molecular beam epitaxy. Values of the electron and hole ionization coefficient ratio α/β=2–5 are measured for superlattices with well width Lz≥100 Å and α/β>10 is measured in a graded band‐gap superlattice with a total well and barrier width LB+LZ=120 Å. The ratio decreases and becomes less than unity for smaller well sizes. This is caused by an increase in β(E) while α(E) remains fairly constant. The results have been interpreted by considering varying hole confinement and scattering in the coupled quantum wells. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 275493 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Electron and hole impact ionization coefficients in GaAs‐AlxGa1−xAs superlattices | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70308/2/APPLAB-47-9-972-1.pdf | |
dc.identifier.doi | 10.1063/1.95948 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
dc.identifier.citedreference | F. Capasso, W. T. Tsang, A. L. Hutchinson, and G. F. Williams, Appl. Phys. Lett. 40, 38 (1982). | en_US |
dc.identifier.citedreference | F. Capasso, W. T. Tsang, and G. F. Williams, IEEE Trans. Electron Devices ED‐30, 381 (1983). | en_US |
dc.identifier.citedreference | R. J. McIntyre, IEEE Trans. Electron Devices ED‐13, 164 (1966). | en_US |
dc.identifier.citedreference | F. Capasso, J. Vac. Sci. Technol. B 1, 457, (1983). | en_US |
dc.identifier.citedreference | G. E. Stillman and CM. Wolfe, in Semiconductors and Semimetals, edited by R. K. Willardson and A. C. Beer (Academic, New York, 1977), Vol. 12, pp. 291–393. | en_US |
dc.identifier.citedreference | G. E. Bulman, V. M. Robbins, K. F. Brennan, K. Hess, and G. E. Stillman, IEEE Electron Device Lett. EDL‐4, 181 (1983). | en_US |
dc.identifier.citedreference | T. P. Pearsall, Solid State Electron. 21, 297 (1978). | en_US |
dc.identifier.citedreference | N. Holonyak, Jr., R. M. Kolbas, R. D. Dupuis, and P. D. Dapkus, IEEE J. Quantum Electron. QE‐16, 170 (1980). | en_US |
dc.identifier.citedreference | J. P. R. David, J. S. Marsland, H. Y. Hall, G. Hill, N. J. Mason, M. A. Pate, J. S. Roberts, P. N. Robson, J. E. Sitch, and R. C. Woods, presented at the Eleventh International Symposium on Gallium Arsenide and Related Compounds, Biarritz, France 1984, Inst. Phys. Conf. Ser. 74, 247 (1985). | en_US |
dc.identifier.citedreference | B. K. Ridley, J. Phys. C 16, 4733 (1983). | en_US |
dc.owningcollname | Physics, Department of |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.