Submicron three-dimensional infrared GaAs/AlxOyGaAs/AlxOy-based photonic crystal using single-step epitaxial growth
dc.contributor.author | Sabarinathan, Jayshri | en_US |
dc.contributor.author | Bhattacharya, Pallab K. | en_US |
dc.contributor.author | Zhu, Donghai | en_US |
dc.contributor.author | Kochman, Boaz | en_US |
dc.contributor.author | Zhou, Weidong | en_US |
dc.contributor.author | Yu, Pei-Chen | en_US |
dc.date.accessioned | 2010-05-06T21:58:55Z | |
dc.date.available | 2010-05-06T21:58:55Z | |
dc.date.issued | 2001-05-14 | en_US |
dc.identifier.citation | Sabarinathan, Jayshri; Bhattacharya, Pallab; Zhu, Donghai; Kochman, Boaz; Zhou, Weidong; Yu, Pei-Chen (2001). "Submicron three-dimensional infrared GaAs/AlxOyGaAs/AlxOy-based photonic crystal using single-step epitaxial growth." Applied Physics Letters 78(20): 3024-3026. <http://hdl.handle.net/2027.42/70323> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70323 | |
dc.description.abstract | A relatively simple technique is demonstrated to fabricate three-dimensional face-centered-cubic infrared photonic crystals with submicron feature sizes using GaAs-based technology, single-step epitaxial growth, and lateral wet oxidation. The photonic crystals were fabricated with feature sizes (a) of 1.5 and 0.5 μm. Transmission measurements reveal a stopband centered at 1.0 μm with a maximum attenuation of 10 dB for the submicron (a = 0.5 μm)(a=0.5μm) photonic crystal. This technique is scalable to small photonic crystal periodicity and hence to shorter wavelengths. © 2001 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 339001 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Submicron three-dimensional infrared GaAs/AlxOyGaAs/AlxOy-based photonic crystal using single-step epitaxial growth | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Solid State Electronic Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70323/2/APPLAB-78-20-3024-1.pdf | |
dc.identifier.doi | 10.1063/1.1372198 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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