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Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime

dc.contributor.authorBerger, Paul R.en_US
dc.contributor.authorChang, Kevin H.en_US
dc.contributor.authorBhattacharya, Pallab K.en_US
dc.contributor.authorSingh, Jaspriten_US
dc.contributor.authorBajaj, K. K.en_US
dc.date.accessioned2010-05-06T22:10:40Z
dc.date.available2010-05-06T22:10:40Z
dc.date.issued1988-08-22en_US
dc.identifier.citationBerger, Paul R.; Chang, Kevin; Bhattacharya, Pallab; Singh, Jasprit; Bajaj, K. K. (1988). "Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime." Applied Physics Letters 53(8): 684-686. <http://hdl.handle.net/2027.42/70448>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70448
dc.description.abstractTheoretical and experimental studies are presented to understand the initial stages of growth of InGaAs on GaAs. Thermodynamic considerations show that, as strain increases, the free‐energy minimum surface of the epilayer is not atomically flat, but three‐dimensional in form. Since by altering growth conditions the strained epilayer can be grown near equilibrium or far from equilibrium, the effect of strain on growth modes can be studied. In situ reflection high‐energy electron diffraction studies are carried out to study the growth modes and surface lattice spacing before the onset of dislocations. The surface lattice constant does not change abruptly from that of the substrate to that of the epilayer at the critical thickness, but changes monotonically. These observations are consistent with the simple thermodynamic considerations presented.en_US
dc.format.extent3102 bytes
dc.format.extent364883 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleRole of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regimeen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122en_US
dc.contributor.affiliationotherAvionics Laboratory (AFWAL/AADR), Wright–Patterson Air Force Base, Ohio 45433en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70448/2/APPLAB-53-8-684-1.pdf
dc.identifier.doi10.1063/1.99850en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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