Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime
dc.contributor.author | Berger, Paul R. | en_US |
dc.contributor.author | Chang, Kevin H. | en_US |
dc.contributor.author | Bhattacharya, Pallab K. | en_US |
dc.contributor.author | Singh, Jasprit | en_US |
dc.contributor.author | Bajaj, K. K. | en_US |
dc.date.accessioned | 2010-05-06T22:10:40Z | |
dc.date.available | 2010-05-06T22:10:40Z | |
dc.date.issued | 1988-08-22 | en_US |
dc.identifier.citation | Berger, Paul R.; Chang, Kevin; Bhattacharya, Pallab; Singh, Jasprit; Bajaj, K. K. (1988). "Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime." Applied Physics Letters 53(8): 684-686. <http://hdl.handle.net/2027.42/70448> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70448 | |
dc.description.abstract | Theoretical and experimental studies are presented to understand the initial stages of growth of InGaAs on GaAs. Thermodynamic considerations show that, as strain increases, the free‐energy minimum surface of the epilayer is not atomically flat, but three‐dimensional in form. Since by altering growth conditions the strained epilayer can be grown near equilibrium or far from equilibrium, the effect of strain on growth modes can be studied. In situ reflection high‐energy electron diffraction studies are carried out to study the growth modes and surface lattice spacing before the onset of dislocations. The surface lattice constant does not change abruptly from that of the substrate to that of the epilayer at the critical thickness, but changes monotonically. These observations are consistent with the simple thermodynamic considerations presented. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 364883 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Role of strain and growth conditions on the growth front profile of InxGa1−xAs on GaAs during the pseudomorphic growth regime | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Center for High Frequency Microelectronics, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122 | en_US |
dc.contributor.affiliationother | Avionics Laboratory (AFWAL/AADR), Wright–Patterson Air Force Base, Ohio 45433 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70448/2/APPLAB-53-8-684-1.pdf | |
dc.identifier.doi | 10.1063/1.99850 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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dc.owningcollname | Physics, Department of |
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