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Electron diffraction studies of hot molecules. IV. Asymmetries of nonbonded distribution functions of SF6, SiF4, and CF4

dc.contributor.authorBartell, Lawrence S.en_US
dc.contributor.authorStanton, John F.en_US
dc.date.accessioned2010-05-06T22:13:11Z
dc.date.available2010-05-06T22:13:11Z
dc.date.issued1984-11-01en_US
dc.identifier.citationBartell, Lawrence S.; Stanton, John F. (1984). "Electron diffraction studies of hot molecules. IV. Asymmetries of nonbonded distribution functions of SF6, SiF4, and CF4." The Journal of Chemical Physics 81(9): 3792-3795. <http://hdl.handle.net/2027.42/70475>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70475
dc.description.abstractHighly significant improvements in the agreement between observed and calculated intensities of electrons diffracted by hot molecules were obtained by optimizing the skew parameter â for the nonbonded distributions. Derived â values (±2σ) were 2.75(11), 0.72(13), and 2.0(4) Å−1 for SF6, SiF4, and CF4, respectively. These measured skew parameters are approximately 2 Å−1 higher in each case than values previously proposed on the basis of Morse asymmetry factors and the nonlinear transformation between curvilinear and normal coordinates of molecules. The principal factor responsible for the increase is the previously unknown intrinsic anharmonicity in bending deformations. Silicon tetrafluoride has a lower â value than the other molecules studied primarily because its bending force constant is lower, relative to stretching. Practical as well as theoretical implications of present findings are discussed.en_US
dc.format.extent3102 bytes
dc.format.extent305359 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleElectron diffraction studies of hot molecules. IV. Asymmetries of nonbonded distribution functions of SF6, SiF4, and CF4en_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70475/2/JCPSA6-81-9-3792-1.pdf
dc.identifier.doi10.1063/1.448179en_US
dc.identifier.sourceThe Journal of Chemical Physicsen_US
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dc.owningcollnamePhysics, Department of


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