Growth of high-quality GaAs/AlAs Bragg mirrors on patterned InP-based quantum well mesa structures
dc.contributor.author | Gebretsadik, H. | en_US |
dc.contributor.author | Kamath, Kishore K. | en_US |
dc.contributor.author | Linder, Kojo K. | en_US |
dc.contributor.author | Zhang, X. | en_US |
dc.contributor.author | Bhattacharya, Pallab K. | en_US |
dc.contributor.author | Caneau, C. | en_US |
dc.contributor.author | Bhat, R. | en_US |
dc.date.accessioned | 2010-05-06T22:15:44Z | |
dc.date.available | 2010-05-06T22:15:44Z | |
dc.date.issued | 1997-08-04 | en_US |
dc.identifier.citation | Gebretsadik, H.; Kamath, K.; Linder, K. K.; Zhang, X.; Bhattacharya, P.; Caneau, C.; Bhat, R. (1997). "Growth of high-quality GaAs/AlAs Bragg mirrors on patterned InP-based quantum well mesa structures." Applied Physics Letters 71(5): 581-583. <http://hdl.handle.net/2027.42/70502> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70502 | |
dc.description.abstract | We have investigated the regrowth of GaAs/AlAs quarter-wave Bragg reflectors on patterned mesa InP-based quantum well heterostructures that can be fabricated into 1.55 μm vertical cavity surface emitting lasers. It is seen from transmission electron and scanning electron microscopy that the multiple layer GaAs-based mirrors can be grown on InP-based heterostructure mesas of diameters 10–40 μm without noticeable propagation of defects into the reflector layers or the quantum well region below. At the same time the photoluminescence from the quantum wells after regrowth indicates that lasers can be fabricated. © 1997 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 815917 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Growth of high-quality GaAs/AlAs Bragg mirrors on patterned InP-based quantum well mesa structures | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, Solid State Electronics Laboratory, University of Michigan, Ann Arbor, Michigan 48109-2122 | en_US |
dc.contributor.affiliationother | Bellcore, Redbank, New Jersey 07701-5699 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70502/2/APPLAB-71-5-581-1.pdf | |
dc.identifier.doi | 10.1063/1.119800 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
dc.identifier.citedreference | J. M. Dallesasse, N. Holonyak, Jr., A. R. Sugg, T. A. Richard, and N. El-Zein, Appl. Phys. Lett. APPLAB57, 2844 (1990). | en_US |
dc.identifier.citedreference | D. L. Huffaker, L. A. Graham, H. Deng, and D. G. Deppe, IEEE Photonics Technol. Lett. IPTLEL8, 974 (1996). | en_US |
dc.identifier.citedreference | K. D. Choquette, K. L. Lear, R. P. Schneider, Jr., S. P. Kilcoyne, and K. M. Geib, Electron. Lett. ELLEAK31, 208 (1995). | en_US |
dc.identifier.citedreference | M. A. Fisher, Y. Z. Huang, A. J. Dann, D. J. Elton, M. J. Harlow, S. D. Perrin, J. Reed, I. Reid, and M. J. Adams, IEEE Photonics Technol. Lett. IPTLEL7, 608 (1995). | en_US |
dc.identifier.citedreference | K. Uomi, S. J. Yoo, A. Scherer, R. Bhat, N. C. Andreadakis, C. E. Zah, M. A. Koza, and T. P. Lee, IEEE Photonics Technol. Lett. IPTLEL6, 317 (1994). | en_US |
dc.identifier.citedreference | T. Baba, Y. Yogo, K. Suzuki, F. Koyama, and K. Iga, Electron. Lett. ELLEAK29, 913 (1993). | en_US |
dc.identifier.citedreference | D. I. Babic, J. J. Dudley, K. Streubel, R. P. Mirin, J. E. Bowers, and E. L. Hu, Appl. Phys. Lett. APPLAB66, 1030 (1995). | en_US |
dc.identifier.citedreference | E. A. Fitzgerald, G. P. Watson, R. E. Proano, D. G. Ast, J. Appl. Phys. JAPIAU65, 2220 (1989). | en_US |
dc.identifier.citedreference | S. V. Ghaisas and A. Madhukar, J. Vac. Sci. Technol. B JVTBD97, 264 (1989). | en_US |
dc.identifier.citedreference | W. Hagen and H. Strunk, Appl. Phys. Lett. APPLAB17, 85 (1978). | en_US |
dc.identifier.citedreference | W. Q. Li, P. K. Bhattacharya, and R. L. Tober, Appl. Phys. Lett. APPLAB58, 1931 (1991). | en_US |
dc.identifier.citedreference | J. W. Matthews and A. E. Blakeslee, J. Cryst. Growth JCRGAE27, 118 (1974). | en_US |
dc.identifier.citedreference | C. L. Chua, Z. H. Zhu, and Y. H. Lo, IEEE Photonics Technol. Lett. IPTLEL7, 444 (1995). | en_US |
dc.owningcollname | Physics, Department of |
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